公开(公告)号：US20160145762A1

公开(公告)日：2016-05-26

申请号：US14947714

申请日：2015-11-20

Applicant: Samsung Display Co., Ltd.

Inventor： Sungsoon IM ,  Kyu H. HWANG ,  Jaesik KIM ,  Minho MOON ,  Youngmin MOON ,  Soonchul CHANG ,  Taewook KANG

IPC: C25D21/12 ,  H01L51/00 ,  H01L51/56 ,  B05B15/04 ,  C25D1/10

CPC classification number: C25D1/10 ,  B05B12/20 ,  B05C21/005 ,  H01L51/0011

Abstract: A deposition mask including a mask body including a plurality of pattern holes; a plurality of protrusions protruding from the mask body; and a plurality of grooves formed in the mask body. A grain size of the mask body is in arrange of about 10 μm to about 1000 μm, and a difference between a maximum height of the plurality of protrusions and a maximum height of the plurality of grooves is equal to or less than 0.5 μm.

Abstract translation: 1.一种沉积掩模，包括具有多个图形孔的掩模体; 从所述面罩主体突出的多个突起; 以及形成在面罩主体中的多个凹槽。 掩模体的晶粒尺寸为约10μm至约1000μm，并且多个突起的最大高度与多个凹槽的最大高度之间的差等于或小于0.5μm。