公开(公告)号：US11978615B2

公开(公告)日：2024-05-07

申请号：US17717521

申请日：2022-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Hyun-Woo Kim ,  Sangmok Nam ,  Jaeho Byeon ,  Jongho Hyun ,  Nam-Jin Hyung

IPC: H01J37/34 ,  C23C14/35

CPC classification number: H01J37/347 ,  C23C14/35 ,  H01J37/3435 ,  H01J37/3455 ,  H01J2237/332

Abstract: A sputtering apparatus includes a back plate supporting a sputtering target, a magnet module disposed under the back plate and including a magnet unit reciprocating in a first direction, a first shielding member attached on a portion of the magnet unit, moving together with the magnet unit, and covering at least a portion of the magnet unit, a protective sheet disposed between the back plate and the magnet module, and a second shielding member disposed between the back plate and the magnet module, and having a fixed position.