公开(公告)号：US20200180103A1

公开(公告)日：2020-06-11

申请号：US16582658

申请日：2019-09-25

申请人： Samsung Display Co., Ltd.

发明人： Sangheon YE ,  Seyoon OH ,  Seonghyeon CHEON

IPC分类号： B24B49/12 ,  B24B37/005 ,  B24B37/27 ,  B24B37/34 ,  B24B53/017 ,  G01B11/06

摘要： An apparatus for monitoring polishing includes a substrate transferring unit configured to transfer a substrate including at least one inorganic layer along a first direction; a polishing unit on the substrate transferring unit; a cleaning unit and a drying unit on the substrate transferring unit; and a monitoring unit on the substrate transferring unit, the monitoring unit including a plurality of optical probes configured to measure reflected lights reflected from respective ones of a plurality of different positions of the substrate. The polishing unit, the cleaning unit, the drying unit, and the monitoring unit are sequentially located along the first direction.

公开(公告)号：US20200049496A1

公开(公告)日：2020-02-13

申请号：US16412706

申请日：2019-05-15

申请人： Samsung Display Co., Ltd.

发明人： Seonghyeon CHEON

IPC分类号： G01B15/02 ,  F25D19/00

摘要： An apparatus for measuring thickness includes: a chamber; a sound wave transmitter transmitting a sound wave in the chamber; a sound wave receiver receiving the sound wave transmitted from the sound wave transmitter in the chamber; and a supporter between the sound wave transmitter and the sound wave receiver.