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    Display panel
    1.
    发明授权
    Display panel 有权

    公开(公告)号：US10365512B2

    公开(公告)日：2019-07-30

    申请号：US14921653

    申请日：2015-10-23

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jung-Gun Nam ,  Hyang-Shik Kong ,  Soo-Lin Kim ,  Tae-Woo Kim ,  Dae-Young Lee ,  Gug-Rae Jo

    IPC: G02B5/20 ,  G02B5/30 ,  G02F1/1335

    Abstract: A display panel including a plurality of pixels. Each of the pixels includes a light blocking part configured to define a first opening, a second opening, and a third opening, a first color filter which overlaps the first opening, a second color filter which overlaps the second opening and having a green color, a third color filter which overlaps the third opening, and a wire grid polarizer including a first stitch line spaced apart from the second opening in a plan view.

    DISPLAY PANEL
    2.
    发明申请
    DISPLAY PANEL 审中-公开
    显示面板

    公开(公告)号：US20160313601A1

    公开(公告)日：2016-10-27

    申请号：US14921653

    申请日：2015-10-23

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jung-Gun NAM ,  Hyang-Shik Kong ,  Soon-Lin Kim ,  Tae-Woo Kim ,  Dae-Young Lee ,  Gug-Rae Jo

    IPC: G02F1/1335 ,  G02B5/20 ,  G02B5/30

    CPC classification number: G02F1/133528 ,  G02B5/201 ,  G02B5/3058 ,  G02F1/133512 ,  G02F1/133514 ,  G02F2001/133548 ,  G02F2001/133567

    Abstract: A display panel including a plurality of pixels. Each of the pixels includes a light blocking part configured to define a first opening, a second opening, and a third opening, a first color filter which overlaps the first opening, a second color filter which overlaps the second opening and having a green color, a third color filter which overlaps the third opening, and a wire grid polarizer including a first stitch line spaced apart from the second opening in a plan view.

    Abstract translation: 包括多个像素的显示面板。 每个像素包括被配置为限定第一开口，第二开口和第三开口的遮光部分，与第一开口重叠的第一滤色器，与第二开口重叠并具有绿色的第二滤色器， 与第三开口重叠的第三滤色器和在平面图中包括与第二开口间隔开的第一线迹线的线栅偏振器。

    IMPRINT LITHOGRAPHY METHOD, METHOD FOR MANUFACTURING MASTER TEMPLATE USING THE METHOD, AND MASTER TEMPLATE MANUFACTURED BY THE METHOD
    3.
    发明申请
    IMPRINT LITHOGRAPHY METHOD, METHOD FOR MANUFACTURING MASTER TEMPLATE USING THE METHOD, AND MASTER TEMPLATE MANUFACTURED BY THE METHOD 审中-公开
    显影方法，使用该方法制造主模板的方法，以及通过该方法制造的主模板

    公开(公告)号：US20160288373A1

    公开(公告)日：2016-10-06

    申请号：US14881909

    申请日：2015-10-13

    Applicant: Samsung Display Co., Ltd.

    Inventor： Tae-Woo Kim ,  Jung-Gun Nam ,  Min-Hyuck Kang ,  Dae-Young Lee ,  Gug-Rae Jo

    IPC: B29C33/38 ,  G03F7/00

    CPC classification number: B29C33/3842 ,  B29K2995/0027 ,  G03F7/0002

    Abstract: An imprint lithography method includes providing a substrate, forming a first imprint pattern, forming a first resist pattern, etching an object, removing the first resist pattern, forming a second imprint pattern, forming a second resist pattern, etching the object and removing the second resist pattern. The substrate includes a first area, a second area, a third area, and a fourth area. The first imprint pattern is formed on the base substrate in the first and third area. The first resist pattern is formed configured to cover the second area on the base substrate on which the first imprint pattern is formed. The second imprint pattern is formed on the base substrate in the second and fourth areas. The second resist pattern is formed configured to cover the first area on the base substrate on which the second imprint pattern.

    Abstract translation: 压印光刻方法包括提供基板，形成第一印记图案，形成第一抗蚀剂图案，蚀刻物体，去除第一抗蚀剂图案，形成第二印记图案，形成第二抗蚀剂图案，蚀刻物体， 抗蚀图案 基板包括第一区域，第二区域，第三区域和第四区域。 第一印记图案形成在第一和第三区域的基底基板上。 第一抗蚀剂图案被形成为覆盖形成有第一印记图案的基底基板上的第二区域。 第二印记图案形成在第二和第四区域的基底基板上。 第二抗蚀剂图案被形成为覆盖在其上具有第二印记图案的基底基板上的第一区域。

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