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公开(公告)号:US20190153318A1
公开(公告)日:2019-05-23
申请号:US16157054
申请日:2018-10-10
发明人: Jonghee PARK , Kitae KIM , Jinseock KIM , Beomsoo KIM , Sangtae KIM , Kyungbo SHIM , Giyong NAM , Youngjin YOON , Daesung LIM
CPC分类号: C09K13/06 , H01L27/1259 , H01L27/3258 , H01L27/3276 , H01L51/0017 , H01L51/0023 , H01L51/5215 , H01L51/5218 , H01L51/5234 , H01L51/5253 , H01L51/56
摘要: An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.