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公开(公告)号：US20190153318A1
公开(公告)日：2019-05-23
申请号：US16157054
申请日：2018-10-10
发明人： Jonghee PARK , Kitae KIM , Jinseock KIM , Beomsoo KIM , Sangtae KIM , Kyungbo SHIM , Giyong NAM , Youngjin YOON , Daesung LIM
CPC分类号： C09K13/06 , H01L27/1259 , H01L27/3258 , H01L27/3276 , H01L51/0017 , H01L51/0023 , H01L51/5215 , H01L51/5218 , H01L51/5234 , H01L51/5253 , H01L51/56
摘要： An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.
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公开(公告)号：US20210343944A1
公开(公告)日：2021-11-04
申请号：US16953047
申请日：2020-11-19
发明人： Jonghee PARK , Jinseock KIM
摘要： An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.
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公开(公告)号：US20220109011A1
公开(公告)日：2022-04-07
申请号：US17554078
申请日：2021-12-17
发明人： Jonghee PARK , Jin Seock KIM
IPC分类号： H01L27/12 , H01L27/32 , H01L21/3213
摘要： A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive pattern by etching the first conductive layer using the photoresist pattern, and removing the photoresist pattern. The forming the first conductive pattern includes forming a first pixel circuit pattern in the panel area, and forming a dummy pattern in the dummy pattern area of the margin area. An opening ratio of a portion where the dummy pattern is not formed with respect to the dummy pattern area is about 30% or more.
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公开(公告)号：US20210057460A1
公开(公告)日：2021-02-25
申请号：US16832613
申请日：2020-03-27
发明人： Jonghee PARK , Jin Seock KIM
IPC分类号： H01L27/12 , H01L27/32 , H01L21/3213
摘要： A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive pattern by etching the first conductive layer using the photoresist pattern, and removing the photoresist pattern. The forming the first conductive pattern includes forming a first pixel circuit pattern in the panel area, and forming a dummy pattern in the dummy pattern area of the margin area. An opening ratio of a portion where the dummy pattern is not formed with respect to the dummy pattern area is about 30% or more.
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5.发明申请公开(公告)号：US20200148951A1
公开(公告)日：2020-05-14
申请号：US16579073
申请日：2019-09-23
发明人： Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE , Zheng HONG
IPC分类号： C09K13/06
摘要： An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.
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公开(公告)号：US20200148950A1
公开(公告)日：2020-05-14
申请号：US16575593
申请日：2019-09-19
发明人： Jonghee PARK , Kitae KIM , Jinseock KIM , Gyu-Po KIM , Hyun-Cheol SHIN , Dae-Woo LEE , Sang-Hyuk LEE
IPC分类号： C09K13/06
摘要： An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.
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