公开(公告)号：US20190153318A1

公开(公告)日：2019-05-23

申请号：US16157054

申请日：2018-10-10

申请人： Samsung Display Co., Ltd. ,  Dongwoo Fine-Chem Co., Ltd.

发明人： Jonghee PARK ,  Kitae KIM ,  Jinseock KIM ,  Beomsoo KIM ,  Sangtae KIM ,  Kyungbo SHIM ,  Giyong NAM ,  Youngjin YOON ,  Daesung LIM

IPC分类号： C09K13/06 ,  H01L27/12 ,  H01L51/56 ,  H01L51/52 ,  H01L27/32

CPC分类号： C09K13/06 ,  H01L27/1259 ,  H01L27/3258 ,  H01L27/3276 ,  H01L51/0017 ,  H01L51/0023 ,  H01L51/5215 ,  H01L51/5218 ,  H01L51/5234 ,  H01L51/5253 ,  H01L51/56

摘要： An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

公开(公告)号：US20210343944A1

公开(公告)日：2021-11-04

申请号：US16953047

申请日：2020-11-19

申请人： Samsung Display Co., Ltd.

发明人： Jonghee PARK ,  Jinseock KIM

IPC分类号： H01L51/00 ,  H01L27/32 ,  H01L51/52 ,  H01L51/56 ,  C09K13/06

摘要： An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.

公开(公告)号：US20210074784A1

公开(公告)日：2021-03-11

申请号：US16953188

申请日：2020-11-19

申请人： Samsung Display Co., Ltd.

发明人： Sang Gab KIM ,  Hyunmin CHO ,  Taesung KIM ,  Subin BAE ,  Yu-Gwang JEONG ,  Jinseock KIM

IPC分类号： H01L27/32 ,  H01L51/52 ,  H01L51/56

摘要： A method of manufacturing a display substrate may include the following steps: forming a drain electrode on a pixel area of a substrate; forming a pad electrode on a pad area of the substrate; forming an inorganic insulation layer that covers the drain electrode and the pad electrode; forming an organic insulation member that has a first thickness at the pixel area of the substrate, has a second thickness less than the first thickness at the pad area of the substrate, exposes a first portion of the inorganic insulation layer on the drain electrode, and exposes a second portion of the inorganic insulation layer on the pad electrode; removing the first portion of the inorganic insulation layer and the second portion of the inorganic insulation layer; and partially removing the organic insulation member.

公开(公告)号：US20200168684A1

公开(公告)日：2020-05-28

申请号：US16681697

申请日：2019-11-12

申请人： Samsung Display Co., Ltd.

发明人： Sang Gab KIM ,  Hyunmin CHO ,  Taesung KIM ,  Subin BAE ,  Yu-Gwang JEONG ,  Jinseock KIM

IPC分类号： H01L27/32 ,  H01L51/56 ,  H01L51/52

摘要： A method of manufacturing a display substrate may include the following steps: forming a drain electrode on a pixel area of a substrate; forming a pad electrode on a pad area of the substrate; forming an inorganic insulation layer that covers the drain electrode and the pad electrode; forming an organic insulation member that has a first thickness at the pixel area of the substrate, has a second thickness less than the first thickness at the pad area of the substrate, exposes a first portion of the inorganic insulation layer on the drain electrode, and exposes a second portion of the inorganic insulation layer on the pad electrode; removing the first portion of the inorganic insulation layer and the second portion of the inorganic insulation layer; and partially removing the organic insulation member.

公开(公告)号：US20200148951A1

公开(公告)日：2020-05-14

申请号：US16579073

申请日：2019-09-23

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jonghee PARK ,  Kitae KIM ,  Jinseock KIM ,  Gyu-Po KIM ,  Hyun-Cheol SHIN ,  Dae-Woo LEE ,  Sang-Hyuk LEE ,  Zheng HONG

IPC分类号： C09K13/06

摘要： An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

公开(公告)号：US20200148950A1

公开(公告)日：2020-05-14

申请号：US16575593

申请日：2019-09-19

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jonghee PARK ,  Kitae KIM ,  Jinseock KIM ,  Gyu-Po KIM ,  Hyun-Cheol SHIN ,  Dae-Woo LEE ,  Sang-Hyuk LEE

IPC分类号： C09K13/06

摘要： An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.