-
公开(公告)号：US10955742B2
公开(公告)日：2021-03-23
申请号：US16223175
申请日：2018-12-18
发明人： Jeong-Hun Seo
IPC分类号： G06T7/00 , G03F1/84 , G03F1/36 , G01N21/956
摘要： A method for manufacturing a semiconductor device includes designing a layout, manufacturing a photomask based on the designed layout, and performing a photolithography process using the photomask to form a pattern on a substrate. The manufacturing of the photomask includes preparing the photomask including first and second chip regions, extracting first and second images from the first and second chip regions, respectively, averaging the first and second images to generate a preliminary standard image including a difference region between the first and second images, inserting a normal image into the difference region based on the layout to generate a standard image, and comparing each of the first and second images with the standard image to detect a defect of the first and/or second chip regions.
-
公开(公告)号：US11686998B2
公开(公告)日：2023-06-27
申请号：US17178676
申请日：2021-02-18
发明人： Jeong-Hun Seo
IPC分类号： G03F1/84 , G03F1/36 , G06T7/00 , G01N21/956
CPC分类号： G03F1/84 , G03F1/36 , G06T7/001 , G06T7/0006 , G06T7/97 , G01N21/956 , G06T2207/30148
摘要： A method for manufacturing a semiconductor device includes designing a layout, manufacturing a photomask based on the designed layout, and performing a photolithography process using the photomask to form a pattern on a substrate. The manufacturing of the photomask includes preparing the photomask including first and second chip regions, extracting first and second images from the first and second chip regions, respectively, averaging the first and second images to generate a preliminary standard image including a difference region between the first and second images, inserting a normal image into the difference region based on the layout to generate a standard image, and comparing each of the first and second images with the standard image to detect a defect of the first and/or second chip regions.
-
公开(公告)号：US20190384165A1
公开(公告)日：2019-12-19
申请号：US16223175
申请日：2018-12-18
发明人： Jeong-Hun Seo
摘要： A method for manufacturing a semiconductor device includes designing a layout, manufacturing a photomask based on the designed layout, and performing a photolithography process using the photomask to form a pattern on a substrate. The manufacturing of the photomask includes preparing the photomask including first and second chip regions, extracting first and second images from the first and second chip regions, respectively, averaging the first and second images to generate a preliminary standard image including a difference region between the first and second images, inserting a normal image into the difference region based on the layout to generate a standard image, and comparing each of the first and second images with the standard image to detect a defect of the first and/or second chip regions.
-
公开(公告)号：US11041821B2
公开(公告)日：2021-06-22
申请号：US15938704
申请日：2018-03-28
发明人： Kyoung-Won Kim , Sung-Eun Lee , Jae-Hyun Ahn , Je-Kook Kim , Joon-Yung Park , Kyung-Won Park , Jong-Ik Won , In-Geol Lee , Yu-Dong Bae , Dong-Rak Shin , Kang-Jun Ko , Kyoung-Hoon Kim , Min-Gi Kim , Sang-Il Park , Jeong-Hun Seo
IPC分类号： G01N27/04 , H01R13/52 , H02H5/08 , H04M1/72454 , H04M1/02
摘要： An electronic device and a method for sensing moisture in an electronic device are provided. The method for sensing moisture in an electronic device includes sensing moisture introduced into a connector of the electronic device in a state where one or more functions executable by connection of the connector with an external electronic device are activated. Further, the method includes deactivating the one or more functions based on the sensing; determining whether the introduced moisture is removed in a state where the one or more functions are deactivated; and activating the one or more functions if the moisture is removed.
-
公开(公告)号：US20210173300A1
公开(公告)日：2021-06-10
申请号：US17178676
申请日：2021-02-18
发明人： Jeong-Hun Seo
摘要： A method for manufacturing a semiconductor device includes designing a layout, manufacturing a photomask based on the designed layout, and performing a photolithography process using the photomask to form a pattern on a substrate. The manufacturing of the photomask includes preparing the photomask including first and second chip regions, extracting first and second images from the first and second chip regions, respectively, averaging the first and second images to generate a preliminary standard image including a difference region between the first and second images, inserting a normal image into the difference region based on the layout to generate a standard image, and comparing each of the first and second images with the standard image to detect a defect of the first and/or second chip regions.
-
公开(公告)号：US20180284047A1
公开(公告)日：2018-10-04
申请号：US15938704
申请日：2018-03-28
发明人： Kyoung-Won KIM , Sung-Eun Lee , Jae-Hyun Ahn , Je-Kook Kim , Joon-Yung Park , Kyung-Won Park , Jong-lk Won , In-Geol Lee , Yu-Dong Bae , Dong-Rak Shin , Kang-Jun Ko , Kyoung-Hoon Kim , Min-Gi Kim , Sang-ll Park , Jeong-Hun Seo
摘要： Disclosed is an electronic device including a display; a connector; and a processor configured to sense moisture introduced into the connector in a state where one or more functions executable by connection of the connector with an external electronic device are activated; deactivate the one or more functions based on the sensing; determine whether the introduced moisture is removed in a state where the one or more functions are deactivated; and activate the one or more functions if the moisture is removed.
-
公开(公告)号：US09565280B2
公开(公告)日：2017-02-07
申请号：US14688297
申请日：2015-04-16
发明人： Jeong-Hun Seo
CPC分类号： H04M1/17 , H04M1/0214 , H04M1/0245 , H04M1/0254 , H04M1/72527 , H04M2250/22
摘要： An electronic device for rendering a display unit antifungal. The electronic device includes a body including a display unit; and an antifungal cover that is removeably attached to the body, the antifungal cover including an antifungal module on one surface thereof. If the antifungal cover covers the display unit, the display unit projects a wavelength of light that activates an antifungal property of the antifungal module.
摘要翻译： 一种用于渲染显示单元抗真菌剂的电子设备。 电子设备包括：主体，包括显示单元; 以及可去除地附接到身体的抗真菌覆盖物，所述抗真菌盖在其一个表面上包括抗真菌模块。 如果抗真菌盖覆盖显示单元，则显示单元投射激活抗真菌模块的抗真菌性的光的波长。
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.015 秒)
