公开(公告)号：US08741162B2

公开(公告)日：2014-06-03

申请号：US14072116

申请日：2013-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-kyu Lee ,  Du-hyun Lee ,  Woong Ko

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC classification number: B41C1/02 ,  B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0015

Abstract: Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

Abstract translation: 提供制造纳米压印印模的方法。 该方法可以包括在母板的表面上形成图案，在印模基板的表面上沉积蚀刻阻挡层，在主基板和印模基板的一个表面上涂覆光致抗蚀剂，在其上具有蚀刻阻挡层 形成光刻胶图案，通过将母版基板压靠在印模基板上，通过使用光致抗蚀剂图案蚀刻蚀刻阻挡层形成硬掩模，并使用硬掩模作为蚀刻掩模蚀刻印模基板。

公开(公告)号：US09321213B2

公开(公告)日：2016-04-26

申请号：US13707690

申请日：2012-12-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ki-yeon Yang ,  Woong Ko ,  Jae-kwan Kim ,  Du-hyun Lee ,  Byung-kyu Lee

IPC: G03F7/00 ,  B29C59/02

CPC classification number: B29C59/026 ,  G03F7/0002

Abstract: A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template.

Abstract translation: 模板系统和使用其的纳米压印方法包括具有纳米图案并被配置为将纳米图案转印到基板上的树脂材料的模板，以及压力控制装置，其被配置为改变 根据在基板和模板之间捕获的气泡的强度相对于基板的模板。