公开(公告)号：US09601397B1

公开(公告)日：2017-03-21

申请号：US15163876

申请日：2016-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01L21/66 ,  H01L21/78 ,  H01L21/263

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

公开(公告)号：US20170148613A1

公开(公告)日：2017-05-25

申请号：US15426672

申请日：2017-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01J37/32 ,  G01N22/00 ,  H01R9/05 ,  H01L21/3065 ,  H01L21/67

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

公开(公告)号：US20170069553A1

公开(公告)日：2017-03-09

申请号：US15163876

申请日：2016-05-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01L21/66 ,  H01L21/263 ,  H01L21/78

CPC classification number: H01J37/32935 ,  G01N22/00 ,  H01J37/32082 ,  H01L21/263 ,  H01L21/3065 ,  H01L21/67253 ,  H01L22/26 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

Abstract translation: 本文公开了能够精确检测等离子体工艺中的等离子体状态的微波探测器，包括探针的等离子体监视系统以及使用该系统制造半导体器件的方法。 微波探头包括沿一个方向延伸的主体和连接到主体的一端并具有平板形状的头部。 此外，在等离子体处理中，微波探针非侵入性地联接到腔室，使得头部的表面接触腔室的视口的外表面，并且微波探头通过头部将微波施加到腔室中 并通过头部接收在腔室内产生的信号。

公开(公告)号：US11329174B2

公开(公告)日：2022-05-10

申请号：US16848165

申请日：2020-04-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongyub Lee ,  Woong Ko ,  Changseung Lee ,  Hongkyu Park ,  Chanwook Baik ,  Hongseok Lee ,  Wonjae Joo

IPC: H01L31/0352 ,  H01L27/144 ,  H01L31/02 ,  H01L31/0224 ,  H01L31/0288 ,  H01L31/105 ,  H01L31/18

Abstract: A meta optical device configured to sense incident light includes a plurality of nanorods each having a shape dimension less than a wavelength of the incident light. Each nanorod includes a first conductivity type semiconductor layer, an intrinsic semiconductor layer, and a second conductivity type semiconductor layer. The meta optical device may separate and sense wavelengths of the incident light.

公开(公告)号：US10566176B2

公开(公告)日：2020-02-18

申请号：US15426672

申请日：2017-02-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Se-jin Oh ,  Woong Ko ,  Vasily Pashkovskiy ,  Doug-yong Sung ,  Ki-ho Hwang

IPC: H01J37/32 ,  H01L21/66 ,  H01L21/263 ,  G01N22/00 ,  H01L21/3065 ,  H01L21/67 ,  H01R9/05

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

公开(公告)号：US08741162B2

公开(公告)日：2014-06-03

申请号：US14072116

申请日：2013-11-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-kyu Lee ,  Du-hyun Lee ,  Woong Ko

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC classification number: B41C1/02 ,  B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0015

Abstract: Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask.

Abstract translation: 提供制造纳米压印印模的方法。 该方法可以包括在母板的表面上形成图案，在印模基板的表面上沉积蚀刻阻挡层，在主基板和印模基板的一个表面上涂覆光致抗蚀剂，在其上具有蚀刻阻挡层 形成光刻胶图案，通过将母版基板压靠在印模基板上，通过使用光致抗蚀剂图案蚀刻蚀刻阻挡层形成硬掩模，并使用硬掩模作为蚀刻掩模蚀刻印模基板。

公开(公告)号：US11677036B2

公开(公告)日：2023-06-13

申请号：US17707076

申请日：2022-03-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeongyub Lee ,  Woong Ko ,  Changseung Lee ,  Hongkyu Park ,  Chanwook Baik ,  Hongseok Lee ,  Wonjae Joo

IPC: H01L31/0352 ,  H01L27/144 ,  H01L31/02 ,  H01L31/0224 ,  H01L31/0288 ,  H01L31/105 ,  H01L31/18

CPC classification number: H01L31/035281 ,  H01L27/1443 ,  H01L27/1446 ,  H01L31/02005 ,  H01L31/02019 ,  H01L31/0288 ,  H01L31/022408 ,  H01L31/105 ,  H01L31/1804 ,  H01L31/1864

Abstract: A meta optical device configured to sense incident light includes a plurality of nanorods each having a shape dimension less than a wavelength of the incident light. Each nanorod includes a first conductivity type semiconductor layer, an intrinsic semiconductor layer, and a second conductivity type semiconductor layer. The meta optical device may separate and sense wavelengths of the incident light.

公开(公告)号：US10002927B2

公开(公告)日：2018-06-19

申请号：US15236564

申请日：2016-08-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yun Sung Woo ,  Hiesang Sohn ,  Weonho Shin ,  Eun-Hyoung Cho ,  Chan Kwak ,  Hyeon Cheol Park ,  Youngjin Cho ,  Dong-Su Ko ,  Woong Ko ,  Kwanghee Kim

IPC: H01L29/43 ,  H01L29/16 ,  H01L29/167 ,  H01L31/0224 ,  H01L29/41 ,  H01L33/42 ,  H01L29/45

CPC classification number: H01L29/1606 ,  H01L29/167 ,  H01L29/41 ,  H01L29/413 ,  H01L29/43 ,  H01L29/45 ,  H01L31/022466 ,  H01L33/42

Abstract: A transparent electrode includes a substrate; a first layer disposed on the substrate, the first layer including a graphene mesh structure, the graphene mesh structure including graphene and a plurality of holes; and a second layer disposed on the first layer, wherein the second layer includes a plurality of conductive nanowires.

公开(公告)号：US09321213B2

公开(公告)日：2016-04-26

申请号：US13707690

申请日：2012-12-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ki-yeon Yang ,  Woong Ko ,  Jae-kwan Kim ,  Du-hyun Lee ,  Byung-kyu Lee

IPC: G03F7/00 ,  B29C59/02

CPC classification number: B29C59/026 ,  G03F7/0002

Abstract: A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template.

Abstract translation: 模板系统和使用其的纳米压印方法包括具有纳米图案并被配置为将纳米图案转印到基板上的树脂材料的模板，以及压力控制装置，其被配置为改变 根据在基板和模板之间捕获的气泡的强度相对于基板的模板。