WAFER TESTING APPARATUS AND CONTROL METHOD THEREOF

    公开(公告)号:US20240319229A1

    公开(公告)日:2024-09-26

    申请号:US18606516

    申请日:2024-03-15

    CPC classification number: G01R1/06794 G01R1/07342 G01R31/2831

    Abstract: A wafer testing apparatus includes a probe board disposed above a chamber, a wafer chuck disposed below the probe board and configured to support the wafer, a camera located between the probe board and the wafer chuck and configured to capture images of probe imaging points arranged on a lower surface of the probe board and wafer imaging points arranged on an upper surface of the wafer, and a controller electrically connected to the camera and configured to adjust a tilt of the probe board on the basis of image information acquired by the camera. The probe imaging points include a plurality of probe outer imaging points arranged in a rhombic pattern on the lower surface of the probe board, and the wafer imaging points include a plurality of wafer outer imaging points arranged in a rhombic pattern on the upper surface of the wafer.

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