-
公开(公告)号:US09779198B2
公开(公告)日:2017-10-03
申请号:US14832307
申请日:2015-08-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Daekwon Kang , Donggyun Kim , Jaeseok Yang , Jiyoung Jung , Chunghee Kim , Ha-Young Kim , Sungkeun Park , Younggook Park , Myungsoo Jang , Jintae Kim
CPC classification number: G06F17/5072 , G03F1/36 , G03F1/70 , G06F17/5068 , G06F17/5081
Abstract: A method can include separating a design area of a substrate for a semiconductor integrated circuit (IC) into cell blocks, where a distance between adjacent ones of the cell blocks can be greater than or equal to a minimum distance defined by a design rule for the semiconductor integrated circuit to provide separated cell blocks, designing a layout for the semiconductor IC in the separated cell blocks, and individually coloring the layout of each of the separated cell blocks.
-
公开(公告)号:US09443291B2
公开(公告)日:2016-09-13
申请号:US13950586
申请日:2013-07-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hyung Gu Lee , Tae Chan Kim , Joonki Paik , Donggyun Kim , Seonyung Kim
Abstract: In one example embodiment, a lens calibration method includes generating a distorted image by distorting a pattern image that includes at least two reference points separated from a center of the pattern image by different distances. The method further includes generating lens calibration data by comparing the pattern image with the distorted image.
Abstract translation: 在一个示例性实施例中,透镜校准方法包括通过使包含至少两个与图案图像的中心分开的参考点不同距离的图案图像失真来产生失真图像。 该方法还包括通过将图案图像与失真图像进行比较来产生透镜校准数据。
-