公开(公告)号：US20130251238A1

公开(公告)日：2013-09-26

申请号：US13671685

申请日：2012-11-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hak-Seung HAN ,  Jin-Back PARK ,  In-Kyun SHIN

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T7/337 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: A method of aligning an object may include obtaining a first actual image of a first pattern on the object, setting the first actual image as a first reference image, obtaining a second actual image of a second pattern on the object, comparing the second actual image with the first reference image to obtain first relative position difference values of the second actual image with respect to the first reference image, and converting the first relative position difference values into first absolute position difference values with respect to a reference point on the object.

Abstract translation: 对准对象的方法可以包括获得对象上的第一图案的第一实际图像，将第一实际图像设置为第一参考图像，获得对象上的第二图案的第二实际图像，比较第二实际图像 利用第一参考图像获得第二实际图像相对于第一参考图像的第一相对位置差值，并且将第一相对位置差值相对于对象上的参考点转换为第一绝对位置差值。

公开(公告)号：US20170061596A1

公开(公告)日：2017-03-02

申请号：US15160540

申请日：2016-05-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hak-Seung HAN ,  Dong-Gun LEE ,  Dong-Hoon CHUNG

IPC: G06T7/00 ,  H01L21/67 ,  G03F7/20

CPC classification number: G03F7/70783 ,  G03F1/84

Abstract: An apparatus for measuring a mask error and a method for measuring a mask error are provided. The apparatus for measuring a mask error includes a stage configured to accommodate a reference mask having a reference pattern, and a target mask adjacent to the reference mask such that a mask pattern of the target mask faces the reference pattern, a light source configured to irradiate the first beam onto the reference mask and the target mask, a light receiving unit including an image sensor, and the image sensor configured to receive a composite image including a first image generated from the reference pattern and a second image generated from the mask pattern, and generate a third image from the first image and the second image, and a measuring unit configured to measure an error of the mask pattern from the third image.

Abstract translation: 提供了一种用于测量掩模误差的装置和用于测量掩模误差的方法。 用于测量掩模误差的装置包括被配置为容纳具有参考图案的参考掩模和与参考掩模相邻的目标掩模的级，使得目标掩模的掩模图案面向参考图案，被配置为照射 第一光束到参考掩模和目标掩模上，光接收单元包括图像传感器，并且图像传感器被配置为接收包括从参考图案生成的第一图像和从掩模图案生成的第二图像的合成图像， 并从第一图像和第二图像生成第三图像，以及测量单元，被配置为从第三图像测量掩模图案的误差。