公开(公告)号：US09780303B2

公开(公告)日：2017-10-03

申请号：US14719066

申请日：2015-05-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hamamoto Nobuo ,  Miyazaki Hiroshi

IPC: B05B5/08 ,  B05B5/025 ,  H01L51/00 ,  B05B5/035 ,  B05B5/057 ,  B05C5/00 ,  B05C9/00 ,  B05C13/00 ,  B05B13/02

CPC classification number: H01L51/0003 ,  B05B5/0255 ,  B05B5/035 ,  B05B5/057 ,  B05B13/0264 ,  B05C5/00 ,  B05C9/00 ,  B05C13/00 ,  H01L51/0006

Abstract: Embodiments of the invention are directed to a thin film fabricating apparatus which may be employed in mass production and may stably provide a uniform nano-order layer. An exemplary embodiment of a thin film fabricating apparatus includes: an electrode bath which contains a thin film-forming material; a plurality of needle electrodes disposed in the electrode bath; a plurality of ring electrodes disposed on the electrode bath at positions corresponding to the needle electrodes; and a substrate stand disposed opposite to the needle electrodes and the ring electrodes, where the substrate stand holds the substrate, on which a thin film is to be formed.