公开(公告)号：US20130141720A1

公开(公告)日：2013-06-06

申请号：US13690177

申请日：2012-11-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yong PARK ,  Valdimir VOLYNETS ,  Vladimir PROTOPOPOV ,  Sang Heon LEE ,  Sung Ho JANG ,  Sang Jean JEON

IPC: G01J3/443

CPC classification number: G01J3/443 ,  G01N21/68

Abstract: A plasma diagnostic apparatus includes a vacuum chamber unit having at least one electrode and having plasma generated inside. A bias power unit is disposed inside the vacuum chamber unit to apply a radio frequency voltage to an electrode that supports a wafer. A spectrum unit decomposes light emitted from inside the plasma according to wavelengths. A light detection unit detects the light decomposed according to wavelengths. A control unit controls a turn-on and turn-off process of the light detection unit according to a waveform of the radio frequency voltage.

Abstract translation: 等离子体诊断装置包括具有至少一个电极并且内部产生等离子体的真空室单元。 偏置功率单元设置在真空室单元内，以对支撑晶片的电极施加射频电压。 光谱单元根据波长分解从等离子体内部发射的光。 光检测单元检测根据波长分解的光。 控制单元根据射频电压的波形来控制光检测单元的接通和关断处理。

公开(公告)号：US20250149301A1

公开(公告)日：2025-05-08

申请号：US19009570

申请日：2025-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chan Hoon PARK ,  Jung Hwan UM ,  Jin Young PARK ,  Ho Yong PARK ,  Jin Young BANG ,  Jong Woo SUN ,  Sang Jean JEON ,  Je Woo HAN

IPC: H01J37/32 ,  H01L21/67

Abstract: A plasma processing apparatus may include a support configured to receive a substrate, a gas distribution plate (GDP) including a plurality of nozzles facing the support, a main splitter configured to supply a process gas, and an additional splitter configured to supply an acceleration gas or a deceleration gas. The plurality of nozzles may include a plurality of central nozzles, a plurality of outer nozzles, a plurality of middle nozzles configured to spray the process gas and the acceleration gas, a plurality of first nozzles, and a plurality of second nozzles.