SEMICONDUCTOR DEVICE INCLUDING THROUGH VIA

    公开(公告)号:US20250167107A1

    公开(公告)日:2025-05-22

    申请号:US18775049

    申请日:2024-07-17

    Abstract: A semiconductor device is provided. The semiconductor device includes a first structure having a memory block region and an extension region; and a second structure having a peripheral circuit region. The first structure includes memory cells and a word line. The second structure includes a semiconductor body; a through-insulating pattern in the semiconductor body; and a peripheral transistor. The first and second structures include a word line signal path electrically connecting the word line to the peripheral transistor. The word line signal path includes a word line contact that is in contact with the word line in the extension region; a word line routing lower structure electrically connected to the word line contact and extending from the extension region into the memory block region; and a word line routing connection structure electrically connecting the word line routing lower structure to the word line routing peripheral structure.

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