公开(公告)号：US20240302758A1

公开(公告)日：2024-09-12

申请号：US18411581

申请日：2024-01-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ingyun CHUNG ,  Dongjin PARK ,  Sungyong MOON ,  Junyoung JANG

IPC: G03F9/00

CPC classification number: G03F9/7046 ,  G03F9/7049 ,  G03F9/7088 ,  G03F9/7092

Abstract: A pattern correction method includes acquiring, from a database, full shot data including full shot data coordinates and a misalignment value, calculating a deformation coefficient of the full shot data based on a cantilever beam analysis method with respect to the full shot data, extracting first-coordinate data along a first axis in a bit line direction and second-coordinate data along a second axis in a word line direction based on the full shot data, classifying the full shot data based on the first-coordinate data and the second-coordinate data, removing outliers from the full shot data.