公开(公告)号：US20240120224A1

公开(公告)日：2024-04-11

申请号：US18465533

申请日：2023-09-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin Hyuk CHOI ,  Beom Soo HWANG ,  Kong Woo LEE ,  Myung Ki SONG ,  Ja-Yul KIM ,  Kyu Sang LEE ,  Hyun Joo JEON ,  Nam Young CHO

IPC: H01L21/673 ,  H01L21/67 ,  H01L21/677 ,  H01L21/68

CPC classification number: H01L21/67386 ,  H01L21/67259 ,  H01L21/67294 ,  H01L21/67742 ,  H01L21/68 ,  H01L21/6833

Abstract: A semiconductor manufacturing equipment may include a process chamber for treating a substrate; a front-end module including a first transfer robot, wherein the first transfer robot may be configured to transport the substrate received in a container; a transfer chamber between the front-end module and the process chamber, wherein the transfer chamber may be configured to load or unload the substrate into or out of the process chamber; and a cassette capable of receiving a replaceable component capable of being used in the process chamber. The front-end module may include a seat plate configured to move in a sliding manner so as to retract or extend into or from the front-end module. The cassette may be configured to be loaded into the front-end module while the cassette is seated on the seat plate.

公开(公告)号：US20190113847A1

公开(公告)日：2019-04-18

申请号：US16029187

申请日：2018-07-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-Min AHN ,  Ja-Yul KIM ,  Sang-Ha PARK ,  Sang-Hyun PARK ,  Sang-Su YEH

IPC: G03F7/20 ,  G02B26/08

Abstract: In a method of controlling an exposure apparatus, a plurality of spot beams is irradiated from an optical system onto a reference surface. Focal positions of at least some spot beams of the plurality of spot beams on Z axis perpendicular to the reference surface are obtained. A focal plane of the at least some spot beams is calculated from the focal positions. An angle of the optical system relative to the reference surface is aligned based on an angle error between the focal plane and the reference surface.