公开(公告)号：US20210146476A1

公开(公告)日：2021-05-20

申请号：US16906410

申请日：2020-06-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youngchul KWON ,  Changhyun KIM ,  Byoungho LEE ,  Jangwoon SUNG ,  Junhyeok JANG ,  Chulsoo CHOI ,  Manhee HAN

IPC: B23K26/06 ,  B23K26/073

Abstract: A stealth dicing apparatus may include a laser light source, and a linearly focusing lens configured to linearly focus a beam output from the laser light source. The linearly focusing lens includes a horizontal surface, and an inclined surface forming an inclination angle with the horizontal surface. The inclination angle satisfies an expression 34.97R2−146.6R+162.5

公开(公告)号：US20240272561A1

公开(公告)日：2024-08-15

申请号：US18373030

申请日：2023-09-26

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Junho SHIN ,  Seungbeom PARK ,  Jangwoon SUNG ,  Hojun LEE ,  Wookrae KIM ,  Myungjun LEE

IPC: G03F7/00 ,  G06T7/00

CPC classification number: G03F7/706839 ,  G03F7/706 ,  G03F7/70641 ,  G06T7/001 ,  G06T2207/30148

Abstract: Provided is a method of managing a semiconductor processing apparatus, including irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (EUV) light, reflecting or transmitting, by the diffuser, the EUV light, transmitting, by an optical system, the EUV light from the diffuser, receiving, by an image sensor, the EUV light from the optical system, obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions, generating, based on an optical prediction model, a plurality of predictive images estimating a diffraction pattern in the image sensor, adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, and generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors.