METHOD OF INSPECTING SURFACE AND METHOD OF INSPECTING PHOTOMASK USING THE SAME
    2.
    发明申请
    METHOD OF INSPECTING SURFACE AND METHOD OF INSPECTING PHOTOMASK USING THE SAME 有权
    检查表面的方法和使用其检查光电子的方法

    公开(公告)号:US20160356727A1

    公开(公告)日:2016-12-08

    申请号:US15093770

    申请日:2016-04-08

    Abstract: A method of inspecting a surface includes loading an inspection object on a stage of a multibeam inspection device configured to generate a beam array, and scanning a plurality of inspection areas of the inspection object at a same time with the beam array, wherein one of the first inspection areas is smaller than an area formed by a quadrangle connecting respective centers of corresponding four adjacent beams of the beam array, and an adjacent area of the one first inspection area is not scanned with the beam array.

    Abstract translation: 检查表面的方法包括将检查对象加载在被配置为产生光束阵列的多光束检查装置的台上,并且与所述光束阵列同时扫描所述检查对象的多个检查区域,其中, 第一检查区域小于由连接梁阵列的对应的四个相邻梁的各个中心的四边形形成的区域,并且一个第一检查区域的相邻区域不被光束阵列扫描。

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