公开(公告)号：US11048179B2

公开(公告)日：2021-06-29

申请号：US16733325

申请日：2020-01-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ho Yu ,  Jinhwan Lee ,  Minseok Choi ,  Jeonggil Kim ,  Jongbin Park ,  Inho Choi

IPC: G03F7/20

Abstract: An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.

公开(公告)号：US11711883B2

公开(公告)日：2023-07-25

申请号：US17393474

申请日：2021-08-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Minseok Choi ,  Injae Lee ,  Inho Choi ,  Sungyeol Kim ,  Sunghyup Kim ,  Jeonggil Kim ,  Jongbin Park

IPC: H05G2/00 ,  G03F7/20 ,  G03F7/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7055 ,  H05G2/008

Abstract: A droplet accelerating assembly includes an acceleration chamber extending in a first direction parallel to an ejection direction of the droplet, the acceleration chamber having a first side connected to the droplet generator, a second side opposite the first side in the first direction, the second side including a discharge hole, and a fluid flow path, a pressure controller connected to the fluid flow path of the acceleration chamber, the pressure controller being configured to adjust an internal pressure of the acceleration chamber, an electrifier in the acceleration chamber, the electrifier being configured to electrify the droplet ejected by the droplet generator into an electrified droplet, and an accelerator in the acceleration chamber, the accelerator being configured to accelerate the electrified droplet.

公开(公告)号：US11822260B2

公开(公告)日：2023-11-21

申请号：US17939293

申请日：2022-09-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongbin Park ,  Minseok Choi ,  Inho Choi ,  Jeonggil Kim

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70975

Abstract: An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.