公开(公告)号：US20250040279A1

公开(公告)日：2025-01-30

申请号：US18589834

申请日：2024-02-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minkwan KIM ,  Jongwoo HONG ,  Jonghyun GO ,  Haneul KIM ,  Chang Kyu LEE ,  Keun Yeong CHO ,  Joonhyuk HWANG

IPC: H01L27/146

Abstract: An image sensor includes a pixel array in which pixels having photoelectric conversion elements are arranged in a matrix, color filters corresponding to the pixels and configured to selectively transmit light of at least two different wavelength bands, and microlenses on the color filters. At least some of the microlenses may have different shapes depending on respective wavelength bands that respective corresponding color filters at least partially overlapping with the at least some microlenses are configured to selectively transmit, such that the at least some microlenses are configured to compensate for chromatic aberration between the lights passing through the respective corresponding color filters.

公开(公告)号：US20250133853A1

公开(公告)日：2025-04-24

申请号：US18755040

申请日：2024-06-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongwoo HONG ,  Seokjin KWON ,  Beomsuk LEE ,  In Sung JOE ,  Inyong PARK ,  Yangjae YUN ,  Sungeun LEE

IPC: H01L27/146 ,  G02B3/02

Abstract: Disclosed is an image sensor which includes a pixel array including a plurality of unit pixels having photoelectric conversion elements arranged in a matrix form on a semiconductor substrate in a first direction and a second direction crossing the first direction, color filters corresponding to the unit pixels and having at least two different colors, and meta-microlenses on the color filters and configured to condense light incident to the unit pixels.

公开(公告)号：US20240153975A1

公开(公告)日：2024-05-09

申请号：US18495179

申请日：2023-10-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minkwan KIM ,  Minsung HEO ,  Jongwoo HONG ,  Insung JOE

IPC: H01L27/146

CPC classification number: H01L27/14621 ,  H01L27/14627 ,  H01L27/14685

Abstract: An image sensor includes a substrate including a plurality of photoelectric conversion devices, a color filter arranged on the substrate, a reflective absorption layer on the color filter and comprising at least one of tungsten, titanium, and aluminum, an anti-reflective layer arranged on the reflective absorption layer, and a plurality of micro lenses on the anti-reflective layer. The color filter may include a plurality of dielectric layers extending in a first direction that is parallel to a rear surface of the substrate, the plurality of dielectric layers having different thicknesses in a second direction that is perpendicular to the rear surface of the substrate and perpendicular to the first direction, such that the plurality of dielectric layers includes at least one dielectric layer having a thickness in the second direction that varies along the first direction.

公开(公告)号：US20230094482A1

公开(公告)日：2023-03-30

申请号：US17724861

申请日：2022-04-20

Applicant: Samsung Electronics Co., Ltd. ,  RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY

Inventor： Jeongyub LEE ,  Geunyoung YEOM ,  Heeju KIM ,  Jongwoo HONG ,  Yeonhee KIM ,  Kideok BAE ,  Haesoo BAE

IPC: G02B1/00 ,  G03F1/80

Abstract: A meta-optical device and a method of manufacturing a metasurface are provided. The meta-optical device includes a substrate and a nanostructure, wherein the nanostructure includes a first portion and a second portion that differ in at least one of a diameter and a period, wherein a ratio of an etch depth of the second portion to an etch depth of the first portion is about 0.9 to about 1.1, and the nanostructure includes at least one of sulfur, fluorine, and fluorocarbon.

公开(公告)号：US20250151438A1

公开(公告)日：2025-05-08

申请号：US18937958

申请日：2024-11-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jongwoo HONG ,  Changhyun KIM ,  Byoungho LEE ,  Youngjin KIM ,  Gun-Yeal LEE ,  Junhyeok JANG ,  Yoonchan JEONG

IPC: H01L27/146 ,  G06F30/23

Abstract: A method of manufacturing a color-routing element, may include: generating an initial pattern; performing blurring on the initial pattern to generate a reference pattern; performing edge detection on the reference pattern to generate at least one comparison pattern reflecting a process error; performing a simulation to obtain at least one color-routing figure of merit based on the reference pattern and the at least one comparison pattern; updating the initial pattern based on a calculation result of the at least one color-routing figure of merit; generating the updated initial pattern as a target pattern of the color-routing element; and manufacturing the color-routing element based on the target pattern.