公开(公告)号：US20170121820A1

公开(公告)日：2017-05-04

申请号：US15289619

申请日：2016-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjin Chung ,  JongCheol Lee ,  MinHwa Jung ,  Jaechul Shin ,  In-Sun Yi ,  Geunkyu Choi ,  Jungil Ahn ,  Seung Han Lee ,  Jin Pil Heo

IPC: C23C16/52 ,  C23C16/44 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45563

Abstract: A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.