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公开(公告)号：US20180129105A1
公开(公告)日：2018-05-10
申请号：US15809569
申请日：2017-11-10
发明人： Young KIM , Yunhee KIM , Hoon SONG , Kanghee WON , Yeonhee KIM , Kideok BAE , Hongseok LEE
IPC分类号： G02F1/1343 , G02F1/1337 , G02F1/1333 , G02F1/1345 , G02F1/137
摘要： A liquid crystal light deflector includes a first electrode layer including a plurality of pattern electrodes arranged with a constant pitch in a first direction on a first substrate, a first alignment layer covering the first electrode layer and having a plurality of concave portions formed on an upper surface thereof and extending in parallel to a second direction perpendicular to the first direction, a liquid crystal layer including a plurality of liquid crystal molecules each having a long diameter substantially parallel to the concave portions on the first alignment layer, a second electrode layer, which is a common electrode, disposed on the liquid crystal layer, and a second substrate disposed on the second electrode layer.
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公开(公告)号：US20180190909A1
公开(公告)日：2018-07-05
申请号：US15635990
申请日：2017-06-28
发明人： Xianyu WENXU , Yongyoung PARK , Kideok BAE , Wooyoung YANG , Changseung LEE
CPC分类号： H01L22/12 , G01M11/0228 , G01N3/068 , G01N3/08 , G01N2203/0278 , G01N2203/0282 , G01N2203/0641 , H01L21/67288 , H01L22/20 , H01L22/24 , H01L22/26 , H01L51/0031 , H01L51/0096 , H01L51/5253 , Y02E10/549
摘要： A method of evaluating the quality of a thin film layer may include: forming the thin film layer on a substrate; applying a stress to the thin film layer; and evaluating the quality of the thin film layer. A device for evaluating the quality of the thin film layer may include a stress chamber for applying a stress to the thin film layer and a refractive index measuring unit for evaluating the quality of the thin film layer based on a rate of change of a refractive index.
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公开(公告)号：US20230094482A1
公开(公告)日：2023-03-30
申请号：US17724861
申请日：2022-04-20
发明人： Jeongyub LEE , Geunyoung YEOM , Heeju KIM , Jongwoo HONG , Yeonhee KIM , Kideok BAE , Haesoo BAE
摘要： A meta-optical device and a method of manufacturing a metasurface are provided. The meta-optical device includes a substrate and a nanostructure, wherein the nanostructure includes a first portion and a second portion that differ in at least one of a diameter and a period, wherein a ratio of an etch depth of the second portion to an etch depth of the first portion is about 0.9 to about 1.1, and the nanostructure includes at least one of sulfur, fluorine, and fluorocarbon.
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公开(公告)号：US20230044716A1
公开(公告)日：2023-02-09
申请号：US17879546
申请日：2022-08-02
发明人： Seunghoon HAN , Hyunsung PARK , Hyeonsoo PARK , Kideok BAE
IPC分类号： G02B1/00
摘要： A meta-lens, an imaging optics, and an electronic device including the imaging optics are provided. The meta-lens includes at least one meta-layer having a plurality of nanostructures with a less shape dimension than an operating wavelength, modulates a phase and intensity of incident light, and forms a plurality of spots of different brightness on an imaging plane in an asymmetric distribution. The plurality of spots formed on the imaging plane include a main spot and at least one sub-spot that is separated from a center of the main spot and has lower illuminance than the main spot.
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公开(公告)号：US20210088694A1
公开(公告)日：2021-03-25
申请号：US16789675
申请日：2020-02-13
发明人： Jeongyub LEE , Changseung LEE , Kideok BAE , Eunhyoung CHO
摘要： An optical thin film includes a support layer and a dielectric layer on the support layer. The dielectric layer has a refractive index greater than that of the support layer. The dielectric layer includes a compound ADX, which includes a Group 3 element A, a Group 5 element D, and an element X having an atomic weight smaller than an atomic weight of A or D. The optical thin film may exhibit light transmission having a high refractive index and low absorptivity.
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