公开(公告)号：US10551326B2

公开(公告)日：2020-02-04

申请号：US15855520

申请日：2017-12-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyo Hyeong Kang ,  Kang Woong Ko ,  Sung Yoon Ryu ,  Gil Woo Song ,  Jae Hyung Ahn ,  Chul Hyung Yoo ,  Kyoung Hwan Lee ,  Sung Ho Jang ,  Yong Ju Jeon ,  Hyoung Jo Jeon

IPC: G01N21/95 ,  H01L21/66 ,  G06K9/03 ,  G06K9/62 ,  G01N21/88 ,  H01L21/67

Abstract: A method for measuring a semiconductor device is provided. A method for measuring a semiconductor device includes defining an interest area and an acceptable area in a chip area on a wafer; performing a first measurement of the chip area with a spectral imaging device to acquire spectrum data of the chip area; assuming the distribution of the spectrum data of a first pixel in the acceptable area is a normal distribution; calculating a distance from a central point on the normal distribution to second pixels in the interest area; selecting a position of a second pixel having a distance from the central point on the normal distribution greater than a predetermined range, among the second pixels, as a candidate position; and performing a second measurement of the candidate position.

公开(公告)号：US10852259B2

公开(公告)日：2020-12-01

申请号：US16115884

申请日：2018-08-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyoung Hwan Lee ,  Sang Min Kim ,  Young Hoon Sohn ,  Yu Sin Yang ,  Chi Hoon Lee

IPC: G01N23/223 ,  H01L21/67 ,  H01L21/66

Abstract: An apparatus for X-ray inspection is provided. The apparatus includes: a stage on which an inspection target is loaded, the stage including a first surface and an opposite second surface; an X-ray generator disposed on or over the first surface of the inspection target and configured to irradiate the inspection target with incident X-rays; and a detection system disposed on or under the second surface of the inspection target and configured to detect first transmitted X-rays transmitted through the inspection target. The detection unit includes a first lens system and a second lens system. The first transmitted X-rays pass through one of the first lens system and the second lens system. The second lens system includes a micro zone plate.

公开(公告)号：US20190187077A1

公开(公告)日：2019-06-20

申请号：US16115884

申请日：2018-08-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyoung Hwan Lee ,  Sang Min KIM ,  Young Hoon SOHN ,  Yu Sin YANG ,  Chi Hoon LEE

IPC: G01N23/223 ,  H01L21/66 ,  H01L21/67

CPC classification number: G01N23/223 ,  G01N2223/608 ,  G01N2223/646 ,  H01L21/67288 ,  H01L22/12

Abstract: An apparatus for X-ray inspection is provided. The apparatus includes: a stage on which an inspection target is loaded, the stage including a first surface and an opposite second surface; an X-ray generator disposed on or over the first surface of the inspection target and configured to irradiate the inspection target with incident X-rays; and a detection system disposed on or under the second surface of the inspection target and configured to detect first transmitted X-rays transmitted through the inspection target. The detection unit includes a first lens system and a second lens system. The first transmitted X-rays pass through one of the first lens system and the second lens system. The second lens system includes a micro zone plate.