公开(公告)号：US09575421B2

公开(公告)日：2017-02-21

申请号：US14692919

申请日：2015-04-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Myung-soo Hwang ,  Joo-on Park ,  Chang-min Park

IPC: G03F7/20 ,  G03F1/00 ,  G03F1/62 ,  G03F1/66

CPC classification number: G03F7/70983 ,  G03F1/14 ,  G03F1/142 ,  G03F1/62 ,  G03F1/66 ,  G03F7/70733 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70908

Abstract: An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.

Abstract translation: 用于保护极端紫外线（EUV）掩模的装置包括EUV防护薄膜，其允许EUV光通过EUV防护薄膜辐射到EUV掩模上，EUV防护薄膜的尺寸对应于限制EUV光的狭缝的尺寸 EUV掩模的预定部分，在第一方向上的EUV防护薄膜的相对侧处的柔性阻挡膜，第一方向是曝光装置的扫描方向，以及包括第一辊和第二辊的辊单元， 所述柔性阻挡膜的第一部分在所述EUV防护薄膜组件的第一侧围绕所述第一辊缠绕，并且所述柔性阻挡膜的第二部分围绕所述第二辊缠绕在所述EUV防护薄膜的第二侧。

公开(公告)号：US09996009B2

公开(公告)日：2018-06-12

申请号：US15464951

申请日：2017-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang-min Park ,  Myung-soo Hwang ,  Ji-sun Lee

IPC: G03B27/54 ,  G03B27/72 ,  G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/7005 ,  G03F7/7045 ,  G03F7/70466 ,  G03F7/70558

Abstract: An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.

公开(公告)号：US20180031978A1

公开(公告)日：2018-02-01

申请号：US15464951

申请日：2017-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang-min Park ,  Myung-soo Hwang ,  Ji-sun Lee

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/7005 ,  G03F7/7045 ,  G03F7/70466 ,  G03F7/70558

Abstract: An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.

公开(公告)号：US09874809B2

公开(公告)日：2018-01-23

申请号：US15183846

申请日：2016-06-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chang-min Park ,  Jin-hong Park ,  Myung-soo Hwang

IPC: G03F1/64 ,  G03F1/24

CPC classification number: G03F1/64 ,  G03F1/24

Abstract: A pellicle for a reflective mask including a pellicle body, a light shielding pattern, a grating pattern, and a pellicle frame. The pellicle body includes a central region and a peripheral region, wherein the peripheral region surrounds the central region. The light shielding pattern is formed on the peripheral region of the pellicle body; the grating pattern is formed on the light shielding pattern, and the pellicle frame is located under the peripheral region of the pellicle body, and the pellicle frame is configured to support the pellicle body.