公开(公告)号：US20160197000A1

公开(公告)日：2016-07-07

申请号：US14983530

申请日：2015-12-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Namsuk KIM ,  Ohhyung KWON ,  Dae-Sung KIM ,  Jutaek LIM ,  Jaehyung JUNG

IPC: H01L21/687 ,  B08B6/00 ,  B08B3/10 ,  H01L21/67 ,  H01L21/02

CPC classification number: H01L21/0209 ,  H01L21/02041 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/68792

Abstract: A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated s due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck.

Abstract translation: 提供了单晶片型清洁装置。 单晶片型清洁装置被配置为能够控制由于在半导体清洁处理期间旋转晶片而产生的静电电荷以及由静电电荷引起的缺陷。 清洁过程使用安装在卡盘上的电离器。