公开(公告)号：US20040238012A1

公开(公告)日：2004-12-02

申请号：US10885951

申请日：2004-07-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-Jin Park ,  Kyung-Dae Kim ,  Hoi-Sik Chung ,  Pil-Kwon Jun ,  Young-Ho Kim

IPC: B08B009/00

CPC classification number: C11D7/06 ,  C11D7/10 ,  C11D7/264 ,  C11D7/32 ,  C11D7/5004 ,  C11D11/0047 ,  Y10S134/902

Abstract: A cleaning solution for a cured anti-reflective layer (AFC layer) component and a method of cleaning an anti-reflective layer component by using the same, wherein the cleaning solution comprises about 5-30% by weight of ammonium hydroxide, about 23-70% by weight of an organic solvent and about 10-50% by weight of water. When an organic material is spattered to adjacent equipment during implementing a coating process onto a wafer, the equipment is detached and then is dipped into the cleaning solution. Thereafter, the equipment is rinsed and dried. Cured and non-cured organic materials are advantageously removed. Cured organic materials left for a period of time, particularly anti-reflective layer components are advantageously removed.

公开(公告)号：US20040226186A1

公开(公告)日：2004-11-18

申请号：US10876345

申请日：2004-06-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-Mun Chon ,  Jin-Sung Kim ,  Pil-Kwon Jun ,  Sang-Oh Park ,  Yong-Kyun Ko ,  Kwang-Shin Lim ,  Hun-Jung Yi

IPC: F26B003/00

CPC classification number: H01L21/02052 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67034

Abstract: An apparatus of drying semiconductor substrate using azeotrope effect and a drying method using the apparatus are provided. The apparatus includes a bath for storing a fluid, a chamber located above the bath and an apparatus for supplying an organic solvent onto the surface of the fluid in the bath for forming an azeotrope layer at the surface of the fluid and for forming an organic solvent layer over the azeotrope layer. The organic solvent layer and the atmosphere thereon are heated by a heater. The apparatus may further include a drying gas conduit for introducing a drying gas into the chamber.

公开(公告)号：US20040022607A1

公开(公告)日：2004-02-05

申请号：US10627565

申请日：2003-07-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kwang-Shin Lim ,  Pil-Kwon Jun ,  Hun-Jung Yi ,  Sang-Oh Park ,  Yong-Kyun Ko

IPC: A47G019/08

CPC classification number: H01L21/67313 ,  H01L21/67326 ,  H01L21/68707

Abstract: An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.

Abstract translation: 一种装置包括用于容纳流体的腔室，位于腔室中的导向器和用于将多个晶片装载和/或从该引导件卸载的传送机器人。 晶片位于导轨上。 引导件具有用于支撑晶片的支撑构件和用于防止晶片倾斜超过预定范围的止动构件。 止动构件与设置在比由支撑构件支撑的晶片边缘更高的位置处的晶片边缘接触。 晶片引导件具有阻止相邻晶片倾斜并彼此接触的止动件。 因此，可以抑制在干燥过程中晶片彼此粘附时产生的水斑（或水印）等干燥不良。