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公开(公告)号：US20250135448A1
公开(公告)日：2025-05-01
申请号：US18884691
申请日：2024-09-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jinyoung Lee , Hyunsik Kim , Jeongmo Yang , Kyeongtae Lim , Taewon Seo , Sunghyup Kim , Sangyoon Soh
Abstract: A catalyst scrubber apparatus includes a housing having an internal space; a catalyst carrier disposed in the internal space of the housing; and a plurality of nozzles installed in the housing and disposed above the catalyst carrier, wherein at least two of the plurality of nozzles are configured to receive and spray fluid therethrough, the at least two of the plurality of nozzles are shaped and dimensioned to diffuse the fluid sprayed into the internal space of the housing.
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公开(公告)号：US20200333716A1
公开(公告)日：2020-10-22
申请号：US16655973
申请日：2019-10-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： Daesung Jung , Younsok Choi , Jongmin Song , Minho Kang , Sangyoon Soh , Hohyun Lee
Abstract: A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.
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公开(公告)号：US11280753B2
公开(公告)日：2022-03-22
申请号：US16781039
申请日：2020-02-04
Applicant: Samsung Electronics Co., Ltd. , SEMES Co., Ltd.
Inventor： Daesung Jung , Heehwan Kim , Jiyoung Lee , Jongmin Song , Sangyoon Soh
Abstract: Sensors for detecting a substitution between chemicals may include an upper electrode and an electrical signal measurement circuit. A first chemical and a second chemical may be sequentially applied to the upper electrode. A triboelectrification may be generated between the upper electrode and the first and second chemicals to flow different electrical signals through the upper electrode. The electrical signal measurement circuit may measure the electrical signals to detect the substitution between the first and second chemicals. Thus, the second chemical may be applied to a semiconductor substrate from the substitution timing so that an original function of the second chemical may be maintained without a delay of the time for fabricating a semiconductor device.
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公开(公告)号：US11169449B2
公开(公告)日：2021-11-09
申请号：US16655973
申请日：2019-10-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： Daesung Jung , Younsok Choi , Jongmin Song , Minho Kang , Sangyoon Soh , Hohyun Lee
Abstract: A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.
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