公开(公告)号：US20200333716A1

公开(公告)日：2020-10-22

申请号：US16655973

申请日：2019-10-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Daesung Jung ,  Younsok Choi ,  Jongmin Song ,  Minho Kang ,  Sangyoon Soh ,  Hohyun Lee

IPC: G03F7/20 ,  G03F1/00 ,  G03F1/44 ,  G03F9/00 ,  H01L21/67

Abstract: A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.

公开(公告)号：US11908713B2

公开(公告)日：2024-02-20

申请号：US16926956

申请日：2020-07-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Daesung Jung ,  Kwangil Kim

IPC: H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67184 ,  H01L21/67196 ,  H01L21/67742

Abstract: A semiconductor substrate treatment system includes: a chamber having an internal space defined by a first surface and a second surface of the chamber opposing each other, and a third surface of the chamber connected the first surface and the second surface; a transfer device in a central region of the internal space for transferring a semiconductor substrate; an ionizing device including first and second discharge devices on the second surface for emitting ions having a first polarity and a second polarity, respectively, to charge particles in the internal space with the first and second polarities, and a third discharge device disposed above the transfer device, and configured to emit ions having the first and second polarities together; and first and second dust collecting assemblies on the third surface, facing each other, and configured to collect charged particles by generating electric fields having different polarities.

公开(公告)号：US12235287B2

公开(公告)日：2025-02-25

申请号：US17930819

申请日：2022-09-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Daesung Jung ,  Myeongock Ko ,  Meehyun Lim

IPC: G01R1/07 ,  G01R1/04 ,  G01R1/067 ,  G01R1/073 ,  G01R31/20 ,  G01R31/28 ,  G02B27/28 ,  H01L21/683

Abstract: A substrate processing apparatus includes: a chamber configured to perform a wet process and having an internal space, a chuck in the internal spaced and being configured for loading a semiconductor substrate thereon, a probe having an end above the chuck and including an electro-optical crystal and a reflective mirror on one surface of the electro-optical crystal, a measuring unit connected to the probe and configured to provide reference light to the probe, and to detect a polarization component of reflected light reflected from the one end of the probe by the reference light, and a controller configured to calculate an amount of electrostatic charge on a surface of the semiconductor substrate from the polarization component.

公开(公告)号：US20230168278A1

公开(公告)日：2023-06-01

申请号：US17930819

申请日：2022-09-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Daesung Jung ,  Myeongock Ko ,  Meehyun Lim

IPC: G01R1/07 ,  H01L21/683 ,  G02B27/28

CPC classification number: G01R1/071 ,  H01L21/6833 ,  G02B27/283

Abstract: A substrate processing apparatus includes: a chamber configured to perform a wet process and having an internal space, a chuck in the internal spaced and being configured for loading a semiconductor substrate thereon, a probe having an end above the chuck and including an electro-optical crystal and a reflective mirror on one surface of the electro-optical crystal, a measuring unit connected to the probe and configured to provide reference light to the probe, and to detect a polarization component of reflected light reflected from the one end of the probe by the reference light, and a controller configured to calculate an amount of electrostatic charge on a surface of the semiconductor substrate from the polarization component.

公开(公告)号：US20240347370A1

公开(公告)日：2024-10-17

申请号：US18542172

申请日：2023-12-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dongjoon Lee ,  Kyoungran Kim ,  Kwanghyeon Jeong ,  Myeongock Ko ,  Jaeuk Sim ,  Seongbeom Lee ,  Daesung Jung

IPC: H01L21/687 ,  H01L21/66 ,  H05F3/06

CPC classification number: H01L21/68742 ,  H01L22/14 ,  H05F3/06

Abstract: A carrier dechucking system includes a work carrier including a substrate having a first surface, an opposite second surface with a support film attached, and a ring frame surrounding the substrate. The work carrier is placed on a placement table having a support surface on which a lower surface of the support film is maintained, lifting pins configured to move the work carrier, an ionizer configured to eject ions to the lower surface, and a controller. The controller is configured to control the lifting pins to move the work carrier from the support surface to first and second levels, and to control the ionizer to remove static electricity charged on the support film from the support surface to the first level. At the first level, a surface voltage of the first surface of the substrate is lower than a surface voltage of the lower surface of the support film.

公开(公告)号：US11280753B2

公开(公告)日：2022-03-22

申请号：US16781039

申请日：2020-02-04

Applicant: Samsung Electronics Co., Ltd. ,  SEMES Co., Ltd.

Inventor： Daesung Jung ,  Heehwan Kim ,  Jiyoung Lee ,  Jongmin Song ,  Sangyoon Soh

IPC: G01N27/30 ,  H01L21/20 ,  H01L21/67 ,  G01N27/60 ,  G01R19/00 ,  H01L21/66

Abstract: Sensors for detecting a substitution between chemicals may include an upper electrode and an electrical signal measurement circuit. A first chemical and a second chemical may be sequentially applied to the upper electrode. A triboelectrification may be generated between the upper electrode and the first and second chemicals to flow different electrical signals through the upper electrode. The electrical signal measurement circuit may measure the electrical signals to detect the substitution between the first and second chemicals. Thus, the second chemical may be applied to a semiconductor substrate from the substitution timing so that an original function of the second chemical may be maintained without a delay of the time for fabricating a semiconductor device.

公开(公告)号：US11169449B2

公开(公告)日：2021-11-09

申请号：US16655973

申请日：2019-10-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Daesung Jung ,  Younsok Choi ,  Jongmin Song ,  Minho Kang ,  Sangyoon Soh ,  Hohyun Lee

IPC: G03F7/20 ,  H01L21/67 ,  G03F1/44 ,  G03F9/00 ,  G03F1/62

Abstract: A measuring apparatus for a vacuum chamber capable of accurately measuring physical properties or quantities in the vacuum chamber in an exposure process in real time, and a measuring system including the measuring apparatus are described herein. The measuring apparatus includes: a body having a shape of an exposure mask used in an exposure process; and a measuring element in an interior of the body or on a first surface of the body. When the measuring apparatus is positioned in a vacuum chamber during the exposure process, the measuring apparatus is configured to measure physical properties in the vacuum chamber using the measuring element. The body or the measuring element is configured to withstand a vacuum in the vacuum chamber including resisting or preventing physical deformation of the body or the measuring element due to the vacuum.