公开(公告)号：US20190196321A1

公开(公告)日：2019-06-27

申请号：US16225915

申请日：2018-12-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yeon KIM ,  Seong Chul HONG ,  Seong Sue KIM

IPC: G03F1/22 ,  G03F1/52 ,  G03F1/54 ,  G03F1/58

CPC classification number: G03F1/22 ,  G03F1/52 ,  G03F1/54 ,  G03F1/58 ,  H01L21/027

Abstract: An extreme ultraviolet (EUV) mask blank is provided. The EUV mask blank includes a substrate having a first surface and a second surface opposed to each other, a reflective layer having first reflective layers and second reflective layers alternately stacked on the first surface of the substrate, a capping layer on the reflective layer, and a hydrogen absorber layer between the reflective layer and the capping layer, the hydrogen absorber layer configured to store hydrogen and being in contact with the capping layer.

公开(公告)号：US20210157226A1

公开(公告)日：2021-05-27

申请号：US17142704

申请日：2021-01-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ho Yeon KIM ,  Seong Chul HONG ,  Seong Sue KIM

IPC: G03F1/22 ,  G03F1/24 ,  G03F1/52 ,  G03F1/54 ,  G03F1/58

Abstract: An extreme ultraviolet (EUV) mask blank is provided. The EUV mask blank includes a substrate having a first surface and a second surface opposed to each other, a reflective layer having first reflective layers and second reflective layers alternately stacked on the first surface of the substrate, a capping layer on the reflective layer, and a hydrogen absorber layer between the reflective layer and the capping layer, the hydrogen absorber layer configured to store hydrogen and being in contact with the capping layer.