SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

    公开(公告)号:US20190267494A1

    公开(公告)日:2019-08-29

    申请号:US16254842

    申请日:2019-01-23

    Abstract: A semiconductor device includes a gate electrode extending in a first direction on a substrate, a first active pattern extending in a second direction intersecting the first direction on the substrate to penetrate the gate electrode, the first active pattern including germanium, an epitaxial pattern on a side wall of the gate electrode, a first semiconductor oxide layer between the first active pattern and the gate electrode, and including a first semiconductor material, and a second semiconductor oxide layer between the gate electrode and the epitaxial pattern, and including a second semiconductor material. A concentration of germanium of the first semiconductor material may be less than a concentration of germanium of the first active pattern, and the concentration of germanium of the first semiconductor material may be different from a concentration of germanium of the second semiconductor material.

    SEMICONDUCTOR DEVICE
    3.
    发明申请

    公开(公告)号:US20240405090A1

    公开(公告)日:2024-12-05

    申请号:US18390782

    申请日:2023-12-20

    Abstract: A semiconductor device is provided. The semiconductor device includes: a semiconductor device including: an active pattern extending in a first direction; a gate structure including a gate electrode extending in a second direction and a gate spacer on the active pattern, wherein the gate electrode and the gate spacer are spaced apart from each other in the first direction; a source/drain pattern on the active pattern; a contact barrier layer on the source/drain pattern; and a contact filling layer on the contact barrier layer. An uppermost point of the contact barrier layer is between an upper surface of the contact filling layer and a lower surface of the contact filling layer, and outer walls of the contact barrier layer and outer walls of the contact filling layer extend along a common plane.

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