INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240324190A1

    公开(公告)日:2024-09-26

    申请号:US18611146

    申请日:2024-03-20

    CPC classification number: H10B12/50 H10B12/482

    Abstract: An integrated circuit device includes a substrate including a cell array area and a peripheral circuit area next to the cell array area, an isolation layer defining an activation region of the substrate in the peripheral circuit area, the isolation layer including a first insulation pattern and a second insulation pattern surrounding the first insulation pattern, and a gate structure on the substrate in the peripheral circuit area, wherein the second insulation pattern includes one or more surfaces defining a recess into an upper surface of the substrate in a vertical direction, the vertical direction extending perpendicular to the upper surface of the substrate.

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