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1.发明公开公开(公告)号：US20240045342A1
公开(公告)日：2024-02-08
申请号：US18302375
申请日：2023-04-18
Applicant: Samsung Electronics Co., Ltd.
Inventor： Su Bin KONG , Sang-Ho YUN , Woo Jin JUNG
CPC classification number: G03F7/70625 , G03F7/0392 , G03F7/0025 , G03F7/2002 , G03F7/70466
Abstract: A method for inspecting a critical dimension may include providing a substrate, applying a photoresist on the substrate, variably irradiating a dose of light onto the photoresist, performing a photo process to develop the photoresist to form a photoresist pattern, performing an etching process using the photoresist pattern as an etching mask to form a plurality of patterns, measuring a width of each of the plurality of patterns and a spacing between adjacent ones of the plurality of patterns, and identifying a cause of a defect in the photo process based on the measured width and the measured spacing.
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公开(公告)号：US20220066328A1
公开(公告)日：2022-03-03
申请号：US17234908
申请日：2021-04-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Soon Hwan CHA , Chan HWANG , Woo Jin JUNG
IPC: G03F7/20
Abstract: A semiconductor device manufacturing system includes a photolithography apparatus that performs exposure. On a semiconductor substrate including a chip area and a scribe lane area. An etching apparatus etches the exposed semiconductor substrate. An observing apparatus images the etched semiconductor substrate. A controller controls the photolithography apparatus and the etching apparatus. The controller generates a first mask pattern and provides the first mask pattern to the photolithography apparatus. The photolithography apparatus performs exposure on the semiconductor substrate using the first mask pattern. The etching apparatus performs etching on the exposed semiconductor substrate to provide an etched semiconductor substrate. The observing apparatus generates a first semiconductor substrate image by imaging the etched semiconductor substrate corresponding to the scribe lane area. The controller generates a second mask pattern based on the first mask pattern and the first semiconductor substrate image, and provides the second mask pattern to the photolithography apparatus.
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公开(公告)号：US20200067342A1
公开(公告)日：2020-02-27
申请号：US16671776
申请日：2019-11-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yu Su KIM , Ji Young KIM , Se Ho PARK , Woo Jin JUNG , Young Joon PARK , Jung Su PARK
Abstract: An electronic device is provided. The electronic device includes a power receiver (PRx) that includes a receiver coil for receiving a power signal from a wireless power transmitting device and a wireless charging integrated circuit (IC) for converting the power signal into electrical energy, a power management circuit that is electrically connected to the PRx and configured to charge a battery using the electrical energy, and a processor that is electrically connected with the PRx and the power management circuit. The processor activates a power hold mode (PHM) if a charging level of the battery is a fully charged level and controls auxiliary charging of the battery.
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公开(公告)号：US20180062422A1
公开(公告)日：2018-03-01
申请号：US15689818
申请日：2017-08-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yu Su KIM , Ji Young KIM , Se Ho PARK , Woo Jin JUNG , Young Joon PARK , Jung Su PARK
Abstract: An electronic device is provided. The electronic device includes a power receiver (PRx) that includes a receiver coil for receiving a power signal from a wireless power transmitting device and a wireless charging integrated circuit (IC) for converting the power signal into electrical energy, a power management circuit that is electrically connected to the PRx and configured to charge a battery using the electrical energy, and a processor that is electrically connected with the PRx and the power management circuit. The processor activates a power hold mode (PHM) if a charging level of the battery is a fully charged level and controls auxiliary charging of the battery.
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