公开(公告)号：US20200369915A1

公开(公告)日：2020-11-26

申请号：US16645343

申请日：2018-02-13

Applicant: Samsung SDI Co., Ltd.

Inventor： Kunbae NOH ,  Taeksoo KWAK ,  Junyoung JANG ,  Yoonyoung KOO ,  Yonggoog KIM ,  Jingyo KIM ,  Jin-Hee BAE ,  Jun SAKONG ,  Jinwoo SEO ,  Sooyeon SIM ,  Huichan YUN ,  Jiho LEE ,  Kwen-Woo HAN ,  Byeong Gyu HWANG

IPC: C09D183/16 ,  H01L21/306 ,  H01L21/02

Abstract: Provided is a composition for forming a silica layer, the composition containing a silicon-containing polymer and a solvent, wherein a silica layer formed of the composition for forming the silica layer satisfies Relation 1. The definition of Relation 1 is as described in the specification. The definition of Relation 1 is the same as described in the specification.