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公开(公告)号：US6159653A
公开(公告)日：2000-12-12
申请号：US059864
申请日：1998-04-14
IPC分类号： C08F8/14 , C08F12/24 , C08F257/02 , C08F261/02 , C08F261/12 , C08G8/14 , C08G8/30 , G03F7/004 , G03F7/039 , G03C1/705 , G03C1/00
CPC分类号： C08F257/02 , C08F261/02 , C08F261/12 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
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2.发明授权Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations 有权缩醛衍生的羟基芳族聚合物的生产及其在辐射敏感性制剂中的应用公开(公告)号：US06380317B1
公开(公告)日：2002-04-30
申请号：US09427159
申请日：1999-10-26
IPC分类号： C08F25700
CPC分类号： C08F257/02 , C08F261/02 , C08F261/12 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
摘要翻译： 本发明提供了一种通过在酸催化剂存在下使含羟基的聚合物或单体与乙烯基醚和醇反应产生混合的缩醛聚合物的方法。 本发明的方法提供了一类基于混合缩醛的聚合物，其通过一次反应原位制备。 混合的缩醛聚合物合成便宜且易于再现。 将所得混合的缩醛聚合物与光酸产生剂混合并溶解在溶剂中以产生化学增幅抗蚀剂组合物。 一种用于形成图案的方法包括以下步骤：提供化学放大抗蚀剂组合物，用抗蚀剂组合物涂覆基材，将抗蚀剂涂布的基材成像曝光于光化辐射，以及通过显影抗蚀剂涂布的基材形成抗蚀剂图像。
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3.发明授权Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations 有权缩醛衍生的羟基芳族聚合物的生产及其在辐射敏感性制剂中的应用公开(公告)号：US06309793B1
公开(公告)日：2001-10-30
申请号：US09704203
申请日：2000-11-01
IPC分类号： G03F7039
CPC分类号： C08F257/02 , C08F261/02 , C08F261/12 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
摘要翻译： 本发明提供了一种通过在酸催化剂存在下使含羟基的聚合物或单体与乙烯基醚和醇反应产生混合的缩醛聚合物的方法。 本发明的方法提供了一类基于混合缩醛的聚合物，其通过一次反应原位制备。 混合的缩醛聚合物合成便宜且易于再现。 将所得混合的缩醛聚合物与光酸产生剂混合并溶解在溶剂中以产生化学增幅抗蚀剂组合物。 一种用于形成图案的方法包括以下步骤：提供化学放大抗蚀剂组合物，用抗蚀剂组合物涂覆基材，将抗蚀剂涂布的基材成像曝光于光化辐射，以及通过显影抗蚀剂涂布的基材形成抗蚀剂图像。
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公开(公告)号：US06133412A
公开(公告)日：2000-10-17
申请号：US427160
申请日：1999-10-26
IPC分类号： C08F8/14 , C08F12/24 , C08F257/02 , C08F261/02 , C08F261/12 , C08G8/14 , C08G8/30 , G03F7/004 , G03F7/039 , C08G65/34 , C08J5/13
CPC分类号： C08F257/02 , C08F261/02 , C08F261/12 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： The present invention provides a process for generating mixed acetal polymers by reacting a hydroxyl containing polymer or monomer with vinyl ether and alcohol in the presence of an acid catalyst. The process of this invention provides a new class of polymers based on mixed acetals which are prepared in-situ with one reaction. The mixed acetal polymers are inexpensive to synthesize and readily reproducible. The resulting mixed acetal polymer is blended with a photoacid generator and dissolved in a solvent to produce a chemically amplified resist composition. A process for forming a pattern comprises the steps of providing the chemically amplified resist composition, coating a substrate with the resist composition, imagewise exposing the resist coated substrate to actinic radiation, and forming a resist image by developing the resist coated substrate.
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公开(公告)号：US6027853A
公开(公告)日：2000-02-22
申请号：US8671
申请日：1998-01-16
CPC分类号： G03F7/0233 , G03F7/0045 , Y10S430/106
摘要： The present invention relates to a process for preparing a radiation-sensitive composition, comprising the steps of (1) passing a solution of a crude polymer comprising a mixture of polymer chains having different molecular weights through a porous polymeric media having a predetermined molecular weight cut-off (MWCO) value, thereby separating the crude polymeric mixture into a first fraction comprising polymer chains having molecular weights above the MWCO value and a second fraction comprising polymer chains having molecular weights below the MWCO value; and (2) adding at least one fraction produced in the first step to at least one radiation-sensitive compound and at least one solvent to produce a radiation-sensitive composition.
摘要翻译： 本发明涉及一种制备辐射敏感组合物的方法，包括以下步骤：（1）将包含具有不同分子量的聚合物链的混合物的粗聚合物溶液通过具有预定分子量切割的多孔聚合物介质 （MWCO）值，从而将粗聚合物混合物分离成包含分子量高于MWCO值的聚合物链的第一级分和包含分子量低于MWCO值的聚合物链的第二级分; 和（2）将至少一种在第一步产生的级分加入到至少一种辐射敏感化合物和至少一种溶剂中以产生辐射敏感组合物。
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公开(公告)号：US06924339B2
公开(公告)日：2005-08-02
申请号：US10438132
申请日：2003-05-14
申请人： Binod B. De , Sanjay Malik , Gregory Spaziano , John Joseph Biafore , Patrick Foster , Sidney George Slater , Thomas Steinhausler , Andrew J. Blakeney
发明人： Binod B. De , Sanjay Malik , Gregory Spaziano , John Joseph Biafore , Patrick Foster , Sidney George Slater , Thomas Steinhausler , Andrew J. Blakeney
IPC分类号： C08F212/14 , C08L29/02
CPC分类号： G03F7/091 , C08F8/14 , C08F212/14 , C08F220/18 , C08F2220/306 , C08F2800/10 , C08F2810/20 , C09D133/14 , G03F7/0392 , G03F7/11 , C08F8/12 , C08F2220/285
摘要： Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.
摘要翻译： 包含含羟基聚合物，氨基交联剂和热酸发生剂的热固化组合物的光刻用热固化底涂层，其中含羟基聚合物是包含下式的单元m，n和o的聚合物 ：其中R 1是H或甲基; R 2是取代或未取代的C 6 -C 14芳基丙烯酸酯或C 6 -C 6烷基， 14个芳基甲基丙烯酸酯基团，其中取代的基团可以是苯基，C 1-4烷基或C 1-4烷氧基; R 3是羟基官能化的C 1 -C 8烷基丙烯酸酯，甲基丙烯酸酯或C 6 -C 3 > 14个芳基，R 4是C 1 -C 10直链或支链亚烷基; p是1至5的整数，条件是在[-R 4 O - ] P n中不超过30个碳原子。 R 5是C 1 -C 10直链，支链或环状烷基，取代或未取代的C 6 - C 14芳基或取代或未取代的C 7 -C 15脂肪族烃; m为约40至70，n为约15至35，o为约15至25。
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7.发明授权Silicon-containing acetal protected polymers and photoresists compositions thereof 失效含硅缩醛保护的聚合物及其光致抗蚀剂组合物公开(公告)号：US06783917B2
公开(公告)日：2004-08-31
申请号：US10116717
申请日：2002-04-04
IPC分类号： C08F11214
CPC分类号： C08G77/442 , G03F7/0045 , G03F7/0392 , G03F7/0758 , Y10S430/106
摘要： A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.
摘要翻译： 包含至少一种具有硅取代基的缩醛聚合物的光致抗蚀剂组合物; 条件是硅取代基不直接连接到缩醛官能团，从而在计量条件下提供高分辨率，改进的DOF和改进的尺寸稳定性。
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公开(公告)号：US06610808B2
公开(公告)日：2003-08-26
申请号：US10093079
申请日：2002-03-07
申请人： Binod B. De , Sanjay Malik , Gregory Spaziano , John Joseph Biafore , Patrick Foster , Sidney George Slater , Thomas Steinhausler , Andrew J. Blakeney
发明人： Binod B. De , Sanjay Malik , Gregory Spaziano , John Joseph Biafore , Patrick Foster , Sidney George Slater , Thomas Steinhausler , Andrew J. Blakeney
IPC分类号： C08F21214
CPC分类号： G03F7/11 , C09D133/14
摘要： Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.
摘要翻译： 包含含羟基聚合物，氨基交联剂和热酸发生剂的热固化组合物的光刻用热固化底涂层，其中含羟基聚合物是包含下式的单元m，n和o的聚合物 其中R1是H或甲基; R2是取代或未取代的C6-C14芳基丙烯酸酯或C6-C14芳基甲基丙烯酸酯基，其中取代基可以是苯基，C 1-4烷基或C 1-4烷氧基; R3是丙烯酸羟基官能化C1-C8烷基酯，甲基丙烯酸酯或C6-C14芳基，R4是C1-C10直链或支链亚烷基; p是1至5的整数，条件是在[-R4O-] p中不超过三十个碳原子; R5是C1-C10直链，支链或环状烷基，取代或未取代的C6-C14芳基或取代或未取代的C7-C15脂环族烃; m为约40至70，n为约15至35，o为约15至25。
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公开(公告)号：US6143467A
公开(公告)日：2000-11-07
申请号：US404904
申请日：1999-09-24
申请人： Steve Lien-Chung Hsu , Pamela J. Waterson , Ahmad Naiini , William D. Weber , Sanjay Malik , Andrew J. Blakeney
发明人： Steve Lien-Chung Hsu , Pamela J. Waterson , Ahmad Naiini , William D. Weber , Sanjay Malik , Andrew J. Blakeney
IPC分类号： G03F7/037 , C08G73/22 , C08K5/00 , C08L79/04 , G03F7/004 , G03F7/039 , G03F7/075 , H01L21/027 , C08F283/04 , C08L77/10
CPC分类号： G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0045 , G03F7/0757 , Y10S430/107
摘要： A heat resistant positive-working photosensitive composition that has a polybenzoxazole precursor bearing acid labile functional groups, a photoacid generator, a photosensitizer, and a solvent. The polybenzoxazole precursor bearing acid labile functional groups, has the structure: ##STR1## wherein k.sub.1 is an integer of 1 or 2, k.sub.2 is an interger of 0 or 1, and the sum of k.sub.1 and k.sub.2 is 2; Ar.sub.1 is a tetravalent aromatic, aliphatic, or heterocyclic group, or mixtures thereof; Ar.sub.2 is a divalent aromatic, aliphatic, or heterocyclic group or siloxane group; D is a monovalent acid labile group; and n is an integer from 20 to 200. A portion of Ar.sub.1 can be a divalent aromatic, aliphatic, or heterocyclic diamine moiety such that the fraction of diamine compound is 0-60 mole percent and the sum of diamine and diamino dihydroxy compound is 100%.Preparation of chemical amplification based positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursors, the formulation of the resin composition, and the process for preparing heat-resistant relief structures from this resin composition. The positive photosensitive resin compositions are suitable especially for applications in microelectronics.
摘要翻译： 具有含有酸不稳定官能团的聚苯并恶唑前体的耐热正性感光性组合物，光致酸发生剂，光敏剂和溶剂。 具有酸不稳定性官能团的聚苯并恶唑前体具有以下结构：其中k1为1或2的整数，k2为0或1的整数，k1和k2的和为2; Ar1是四价芳族，脂族或杂环基团，或其混合物; Ar 2是二价芳族，脂族或杂环基或硅氧烷基; D是单价酸不稳定组; n为20〜200的整数.Ar 1的一部分可以是二元芳香族，脂肪族或杂环二胺部分，二胺化合物的分数为0〜60摩尔％，二胺和二氨基二羟基化合物之和为100 ％。 制备基于化学扩增的正性，含水碱性可显影光敏聚苯并恶唑（PBO）前体，树脂组合物的配方，以及由该树脂组合物制备耐热浮雕结构的方法。 正型感光性树脂组合物特别适用于微电子学领域。
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10.发明授权Selected high thermal novolaks and positive-working radiation-sensitive compositions 失效选择的高热酚醛清漆和正性辐射敏感组合物
公开(公告)号：US5985507A
公开(公告)日：1999-11-16
申请号：US25640
申请日：1998-02-18
IPC分类号： G03F7/023 , C08G8/16 , C08G12/06 , C08G14/06 , C08G14/073
摘要： A high thermal alkali-soluble novolak binder resin, comprising the addition-condensation reaction product of a phenolic mixture with at least one aldehyde source, the feedstock of the phenolic mixture for the reaction comprising:(1) about 25 to about 40 weight percent of the phenolic mixture being a monomer selected from meta-cresol 2,5-xylenol or the combination thereof;(2) about 50 to about 70 weight percent of the phenolic mixture being para-cresol; and(3) about 3 to about 20 weight percent of the phenolic mixture being acetamidophenol; all percentages based on the weight of total phenol monomer feedstock.The invention is also directed to a positive working photoresist made from the composition.
摘要翻译： 一种高热碱溶性酚醛清漆粘合剂树脂，其包含酚类混合物与至少一种醛源的加成缩合反应产物，用于反应的酚类混合物的原料包括：（1）约25至约40重量％的 酚类混合物是选自间甲酚2,5-二甲苯酚或其组合的单体; （2）约50至约70重量％的酚混合物为对 - 甲酚; 和（3）约3至约20重量％的酚混合物为乙酰氨基苯酚; 所有百分比均基于总酚单体原料的重量。 本发明还涉及由该组合物制成的正性工作光致抗蚀剂。
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