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公开(公告)号:US10942138B2
公开(公告)日:2021-03-09
申请号:US15215292
申请日:2016-07-20
Applicant: SCHOTT AG
Inventor: Axel Engel , Clemens Kunisch , Ralf Jedamzik , Gerhard Westenberger , Peter Fischer
Abstract: A method is provided for determining the thermal expansion of a low thermal expansion material with very high accuracy of at most +/−3 ppb/K or less and/or with a reproducibility of at most +/−1 ppb/K or less. A measuring device is also provided that includes an advanced push rod dilatometer.
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公开(公告)号:US20210373426A1
公开(公告)日:2021-12-02
申请号:US17333621
申请日:2021-05-28
Applicant: Schott AG
Inventor: Ralf Jedamzik , Peter Naß , Sebastian Leukel , Volker Hagemann , Uwe Petzold
IPC: G03B21/20
Abstract: An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.
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公开(公告)号:US10012562B2
公开(公告)日:2018-07-03
申请号:US14437229
申请日:2013-10-24
Applicant: SCHOTT AG
Inventor: Ralf Jedamzik , Clemens Kunisch , Thoralf Johansson
IPC: G01N25/00 , G01N3/00 , G01K3/00 , G01M11/00 , G01N25/02 , G01N33/38 , G01N19/00 , G02B1/00 , G02B5/08
CPC classification number: G01M11/005 , G01N19/00 , G01N25/02 , G01N33/386 , G02B1/00 , G02B5/08
Abstract: The invention generally relates to manufacturing or providing of glass or glass ceramic products. The invention is based on the object to allow for providing glass or glass ceramic products having very accurately characterized thermo-mechanical properties. For this purpose, a deformation of the glass or glass ceramic material is measured at least twice as a function of time with different rates of change in temperature or a mechanical stress. Based on the measurements, relaxation times and weighting factors are determined by modelling. Then, based on the relaxation times and weighting factors related to the distribution of relaxation processes occurring in the product, a time-delayed change of a temperature-dependent or stress-dependent physical quantity, such as thermal expansion or refractive index, is calculated as a function of a predefined temperature change or stress change. The invention is used for selecting during manufacturing suitable glass products exhibiting selected time-delayed properties.
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公开(公告)号:US20220340478A1
公开(公告)日:2022-10-27
申请号:US17730700
申请日:2022-04-27
Applicant: Schott AG
Inventor: Ralf Jedamzik , Antoine Carré , Sebastian Leukel , Volker Hagemann , Uwe Petzold , Lothar Bartelmess
Abstract: A glass includes the following components in the specified proportions (in % by weight): 50-80% SiO2, 2-30% B2O3, 0-5% Al2O3, 0-10% CaO, 0-10% BaO, 0-5% Li2O, 0-20% Na2O, 1-25% K2O, and 5-30% ΣR2O. R2O includes at least one alkali metal oxide. The glass includes at least one first solarization component and at least one second solarization component. A proportion of the first solarization component in the glass is in a range from 0.01 to
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公开(公告)号:US11698577B2
公开(公告)日:2023-07-11
申请号:US17333621
申请日:2021-05-28
Applicant: Schott AG
Inventor: Ralf Jedamzik , Peter Naß , Sebastian Leukel , Volker Hagemann , Uwe Petzold
IPC: G03B21/20
CPC classification number: G03B21/2033
Abstract: An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.
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公开(公告)号:US20230090497A1
公开(公告)日:2023-03-23
申请号:US17994885
申请日:2022-11-28
Applicant: Schott AG
Inventor: Ralf Jedamzik , Antoine Carré , Sebastian Leukel , Volker Hagemann , Uwe Petzold , Lothar Bartelmess , Peter Nass
Abstract: An imaging system, includes: a laser light source having a wavelength from 380 nm to 490 nm; and a beam guidance element, the laser light source configured for generating an average surface power density of more than 10 W/cm2, the beam guidance element including a glass which has a quality factor F(436 nm)=S(436 nm)*(Abs0(436 nm)+Abs1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Abs1(436 nm) is an additional absorbance in comparison to Abs0(436 nm) at a wavelength of 436 nm after an irradiation with a power density of 345 W/cm2 for 72 hours with a laser light having a wavelength of 455 nm, Abs0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without the irradiation, k is the thermal conductivity, and the quality factor F(436 nm) is
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公开(公告)号:US10202304B2
公开(公告)日:2019-02-12
申请号:US14564290
申请日:2014-12-09
Applicant: SCHOTT AG
Inventor: Ralf Jedamzik
Abstract: The present disclosure relates to a component for low-temperature applications, a process for producing such a component, and the use thereof.
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公开(公告)号:US20150158759A1
公开(公告)日:2015-06-11
申请号:US14564290
申请日:2014-12-09
Applicant: SCHOTT AG
Inventor: Ralf Jedamzik
CPC classification number: C03C10/0027 , C03B32/02 , C03C3/097 , C03C2204/00 , C08K13/04 , Y10T428/24479
Abstract: The present disclosure relates to a component for low-temperature applications, a process for producing such a component, and the use thereof.
Abstract translation: 本公开内容涉及用于低温应用的部件,用于生产这种部件的方法及其用途。
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公开(公告)号:US20240077798A1
公开(公告)日:2024-03-07
申请号:US18468183
申请日:2023-09-15
Applicant: Schott AG
Inventor: Florian Kanal , Ralf Jedamzik , Ina Mitra
IPC: G03F1/24
CPC classification number: G03F1/24
Abstract: A precision extreme ultraviolet lithography (EUVL) component having an average coefficient of thermal expansion (CTE) in a range from 0 to 50° C. of at most 0±0.1×10−6/K, and a thermal hysteresis of
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公开(公告)号:US11465933B2
公开(公告)日:2022-10-11
申请号:US15243078
申请日:2016-08-22
Applicant: SCHOTT AG
Inventor: Ralf Jedamzik , Steffen Grün , Thomas Lifka , Johann Faderl
Abstract: A glass-ceramic component is provided that has a low average coefficient of thermal expansion (CTE) and a high CTE homogeneity. The use of such a component and a process for producing such a component are also provided.
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