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公开(公告)号：US07336511B2
公开(公告)日：2008-02-26
申请号：US11696569
申请日：2007-04-04
申请人： Sean O. Harnett , Mark D. Tracy , Jesse N. Klein
发明人： Sean O. Harnett , Mark D. Tracy , Jesse N. Klein
IPC分类号： H02M1/08
摘要： A method and apparatus for controlling a power supply. The system includes a power supply and a controller for outputting a command signal to regulate the operation of the power supply. The controller determines the command signal based on at least one error signal which is selected from a plurality of error signals based on a selection criterion.
摘要翻译： 一种用于控制电源的方法和装置。 该系统包括电源和用于输出指令信号以调节电源的操作的控制器。 控制器基于基于选择标准从多个误差信号中选择的至少一个误差信号来确定命令信号。
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公开(公告)号：US07206210B2
公开(公告)日：2007-04-17
申请号：US10921078
申请日：2004-08-18
申请人： Sean O. Harnett , Mark D. Tracy , Jesse N. Klein
发明人： Sean O. Harnett , Mark D. Tracy , Jesse N. Klein
IPC分类号： H02M1/08
摘要： A method and apparatus for controlling a power supply. The system includes a power supply and a controller for outputting a command signal to regulate the operation of the power supply. The controller determines the command signal based on at least one error signal which is selected from a plurality of error signals based on a selection criterion.
摘要翻译： 一种用于控制电源的方法和装置。 该系统包括电源和用于输出指令信号以调节电源的操作的控制器。 控制器基于基于选择标准从多个误差信号中选择的至少一个误差信号来确定命令信号。
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公开(公告)号：US06995545B2
公开(公告)日：2006-02-07
申请号：US10642505
申请日：2003-08-18
申请人： Mark D. Tracy , Jesse N. Klein
发明人： Mark D. Tracy , Jesse N. Klein
CPC分类号： H01J37/34 , H01J37/32082 , H01L21/67069 , H01L21/67253
摘要： A fault handling algorithm processes a plurality of fault status signals from a sputtering system in a period of time to generate at least one command signal for affecting the operation of a power generator.
摘要翻译： 故障处理算法在一段时间内处理来自溅射系统的多个故障状态信号，以产生用于影响发电机运行的至少一个命令信号。
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公开(公告)号：US20100012482A1
公开(公告)日：2010-01-21
申请号：US12174893
申请日：2008-07-17
IPC分类号： C23C14/54
CPC分类号： H01J37/3476 , C23C14/54 , H01J37/32027 , H01J37/32055 , H01J37/32935 , H01J37/32944 , H01J37/34 , H01J37/3444 , H01J2237/0206
摘要： A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.
摘要翻译： 一种溅射系统，其包括具有用作阴极的靶材料的溅射室，以及阳极和工件。 直流（DC）电源为阳极和阴极提供足以在溅射室内产生等离子体的电力。 检测模块通过监视等离子体的电特性来检测溅射室中的电弧的发生。 在一个实施例中，所监测的电特性是等离子体的阻抗。 在另一实施例中，电特性是等离子体的电导。
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公开(公告)号：US09613784B2
公开(公告)日：2017-04-04
申请号：US12174893
申请日：2008-07-17
CPC分类号： H01J37/3476 , C23C14/54 , H01J37/32027 , H01J37/32055 , H01J37/32935 , H01J37/32944 , H01J37/34 , H01J37/3444 , H01J2237/0206
摘要： A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.
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