公开(公告)号：US20160013079A1

公开(公告)日：2016-01-14

申请号：US14747704

申请日：2015-06-23

Applicant: Semes Co., Ltd.

Inventor： Jung Bong CHOI ,  Seong Soo KIM ,  Chan-Young HEO ,  Oh Jin KWON

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/6708 ,  H01L21/67051 ,  H01L21/67115 ,  H01L21/67248

Abstract: A substrate treating apparatus is provided which includes a treating container of which a top end is opened, a substrate support unit placed in a treating container to support a substrate, a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit, and a heating unit placed in the substrate support unit to heat the substrate. The heating unit includes a heating element and a reflection element reflecting a heat from the heating element upward.

Abstract translation: 提供了一种基板处理装置，其包括顶端打开的处理容器，放置在处理容器中以支撑基板的基板支撑单元，将处理溶液供给到放置在支撑单元上的基板的处理溶液供给单元 以及放置在基板支撑单元中以加热基板的加热单元。 加热单元包括加热元件和从加热元件向上反射热量的反射元件。