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公开(公告)号：US20150114565A1
公开(公告)日：2015-04-30
申请号：US14528120
申请日：2014-10-30
Applicant: SEMES CO., LTD.
Inventor： Hyung Joon Kim , Seung Kue Kim
IPC: H01J37/32
Abstract: Provided is an apparatus for treating a substrate which is capable of uniformly controlling a temperature of a support plate. The apparatus for treating the substrate includes a chamber having a treating space with an opened top surface, a support unit disposed within the chamber to support the substrate, a dielectric assembly disposed on the opened top surface of the chamber to cover the opened top surface, and a plasma source disposed above the dielectric assembly, the plasma source including an antenna generating plasma from a gas supplied into the chamber. The dielectric assembly includes a dielectric window, and heating units each of which is formed of a non-metallic material, the heating units being disposed on a top surface of the dielectric window to heat the dielectric window.
Abstract translation: 提供一种能够均匀地控制支撑板的温度的基板的处理装置。 用于处理衬底的设备包括具有开放的顶表面的处理空间的腔室，设置在室内以支撑衬底的支撑单元，设置在腔室的敞开的顶表面上以覆盖敞开的顶表面的电介质组件， 以及设置在电介质组件上方的等离子体源，等离子体源包括从供应到腔室中的气体产生等离子体的天线。 电介质组件包括电介质窗和各自由非金属材料形成的加热单元，加热单元设置在电介质窗口的顶表面上以加热电介质窗口。
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公开(公告)号：US10510511B2
公开(公告)日：2019-12-17
申请号：US14528120
申请日：2014-10-30
Applicant: SEMES CO., LTD.
Inventor： Hyung Joon Kim , Seung Kue Kim
IPC: H01J37/32
Abstract: Provided is an apparatus for treating a substrate which is capable of uniformly controlling a temperature of a support plate. The apparatus for treating the substrate includes a chamber having a treating space with an opened top surface, a support unit disposed within the chamber to support the substrate, a dielectric assembly disposed on the opened top surface of the chamber to cover the opened top surface, and a plasma source disposed above the dielectric assembly, the plasma source including an antenna generating plasma from a gas supplied into the chamber. The dielectric assembly includes a dielectric window, and heating units each of which is formed of a non-metallic material, the heating units being disposed on a top surface of the dielectric window to heat the dielectric window.
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公开(公告)号：US10236194B2
公开(公告)日：2019-03-19
申请号：US14264410
申请日：2014-04-29
Applicant: Semes Co., Ltd.
Inventor： Hyung Joon Kim , Seung Kue Kim
Abstract: Provided is a supporting unit supporting a substrate. The supporting unit includes a body including a plurality of heating regions and disposed with the substrate on a top surface thereof and a heating unit heating the body. Herein, the heating unit includes heating lines provided in the plurality of heating regions, respectively, to control temperatures of the plurality of heating regions independently from one another, terminals provided to the body and receiving power from the outside, and connecting lines connecting the heating lines to the terminals mutually corresponding to one another. Also, the terminals are disposed in one of the plurality of heating regions in a top view.
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