公开(公告)号：US12094692B2

公开(公告)日：2024-09-17

申请号：US17455501

申请日：2021-11-18

Applicant: Semes Co., Ltd.

Inventor： Jinhyeok Kim ,  Dongmok Lee ,  Yeonghun Wi ,  Yonghyun Ham ,  Yeonggyo Jeong

IPC: H01J37/32

CPC classification number: H01J37/32642 ,  H01J2237/334

Abstract: An apparatus for processing a substrate may include a processing module including at least one process chamber for performing a desired process on a substrate and an index module transferring the substrate into the processing module from an outside. The at least one process chamber may include a housing providing a process space therein, a supporting unit disposed in the housing to support a substrate, the supporting unit including a focus ring having a plurality of rings, a gas supply unit providing a process gas into the process space, and a plasma generating unit generating a plasma from the process gas in the process space. The focus ring may include a stepped structure having a plurality of stepped portions downwardly provided toward the substrate.