公开(公告)号：US20190131159A1

公开(公告)日：2019-05-02

申请号：US16174683

申请日：2018-10-30

Applicant: SEMES CO., LTD.

Inventor： Harutyun Melikyan ,  Jong Hwan An ,  Jamyung Gu ,  Sang-Kee Lee ,  Young Bin Kim ,  Shin-Woo Nam

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/66 ,  H01J37/32 ,  H01J37/244

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treatment space in the interior thereof, a support unit configured to support a substrate in the treatment space, a gas supply unit configured to supply a gas into the treatment space, and a plasma generating unit configured to generate plasma from the gas, wherein the support unit includes an electrostatic chuck including an upper body having a support surface that suctions the substrate and a lower body extending from the upper body to a lower side, wherein the lower body has an extension part extending laterally from the upper body, a focus ring disposed on the extension part of the electrostatic chuck, and a metallic ring provided between the upper body of the electrostatic chuck and the focus ring and configured to control plasma in an extreme edge of the substrate.

公开(公告)号：US20190088449A1

公开(公告)日：2019-03-21

申请号：US16120498

申请日：2018-09-04

Applicant: Semes Co., Ltd.

Inventor： Ogsen Galstyan ,  Harutyun Melikyan ,  Young Bin Kim ,  Jong Hwan An

IPC: H01J37/32 ,  H01L21/683

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a process chamber having a treatment space in the interior thereof, a support unit configured to support a substrate in the treatment space, a gas supply unit configured to supply a treatment gas into the treatment space, and a plasma generating unit configured to generate plasma from the gas in the treatment space, wherein the plasma generating unit includes a high-frequency power source, a high-frequency antenna, to which a current is applied from the high-frequency power source, and an additional antenna provided to be spaced apart from the high-frequency antenna and to which a coupling current is applied from the high-frequency antenna.

公开(公告)号：US11244847B2

公开(公告)日：2022-02-08

申请号：US16174683

申请日：2018-10-30

Applicant: SEMES CO., LTD.

Inventor： Harutyun Melikyan ,  Jong Hwan An ,  Jamyung Gu ,  Sang-Kee Lee ,  Young Bin Kim ,  Shin-Woo Nam

IPC: H01L21/00 ,  H01L21/683 ,  H01L21/687 ,  H01L21/66 ,  H01J37/32 ,  H01J37/244 ,  H01L21/67

Abstract: Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treatment space in the interior thereof, a support unit configured to support a substrate in the treatment space, a gas supply unit configured to supply a gas into the treatment space, and a plasma generating unit configured to generate plasma from the gas, wherein the support unit includes an electrostatic chuck including an upper body having a support surface that suctions the substrate and a lower body extending from the upper body to a lower side, wherein the lower body has an extension part extending laterally from the upper body, a focus ring disposed on the extension part of the electrostatic chuck, and a metallic ring provided between the upper body of the electrostatic chuck and the focus ring and configured to control plasma in an extreme edge of the substrate.