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公开(公告)号:US20130095617A1
公开(公告)日:2013-04-18
申请号:US13706841
申请日:2012-12-06
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Miyako NAKAJIMA , Hiddekazu Miyairi , Toshiyuki Isa , Erika Kato , Mitsuhiro Ichijo , Kazutaka Kuriki , Tomokazu Yokoi
IPC: H01L29/66
CPC classification number: H01L29/6675 , H01L29/04 , H01L29/4908 , H01L29/66765 , H01L29/78669 , H01L29/78678 , H01L29/78696
Abstract: An object is to provide a thin film transistor with small off current, large on current, and high field-effect mobility, A silicon nitride layer and a silicon oxide layer which is formed by oxidizing the silicon nitride layer are stacked as a gate insulating layer, and crystals grow from an interface of the silicon oxide layer of the gate insulating layer to form a microcrystalline semiconductor layer; thus, an inverted staggered thin film transistor is manufactured. Since crystals grow from the gate insulating layer, the thin film transistor can have a high crystallinity, large on current, and high field-effect mobility. In addition, a buffer layer is provided to reduce off current.
Abstract translation: 本发明的目的是提供一种具有小截止电流,大电流和高场效应迁移率的薄膜晶体管,通过氧化氮化硅层形成的氮化硅层和氧化硅层作为栅绝缘层 并且晶体从栅极绝缘层的氧化硅层的界面生长以形成微晶半导体层; 因此,制造了反交错的薄膜晶体管。 由于晶体从栅极绝缘层生长,所以薄膜晶体管可以具有高结晶度,大电流和高的场效应迁移率。 此外,提供缓冲层以减少电流。