利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

3 条记录 (耗时 0.041 秒)

    Vaporization Apparatus and Method for Controlling the Same
    1.
    发明申请
    Vaporization Apparatus and Method for Controlling the Same 审中-公开
    蒸发装置及其控制方法

    公开(公告)号：US20130011804A1

    公开(公告)日：2013-01-10

    申请号：US13520186

    申请日：2010-12-24

    申请人： Seung Cheol Seo ,  Doo Won Gong ,  Jong Ha Lee ,  Kyung Bum Lee ,  Sung Jae Jung ,  Whang Sin Cho

    发明人： Seung Cheol Seo ,  Doo Won Gong ,  Jong Ha Lee ,  Kyung Bum Lee ,  Sung Jae Jung ,  Whang Sin Cho

    IPC分类号： F27D19/00 ,  F27B14/10

    CPC分类号： C23C16/4485 ,  B01D1/0017 ,  B01D1/0082 ,  C23C14/24 ,  C23C14/543 ,  C23C16/52

    摘要： Disclosed are a vaporization apparatus and a control method for the same. The vaporization apparatus includes a vaporization crucible adapted to receive a raw material; a vaporization heating unit adapted to vaporize the raw material by heating the vaporization crucible; a temperature measuring unit adapted to measure temperature of the vaporization crucible; a power measuring unit adapted to measure an applied power of the vaporization heating unit; and a control unit adapted to control a vaporization quantity of the raw material based on any one of a temperature variation value of the temperature measuring unit and a power variation value of the power measuring unit. The vaporization apparatus uses a non-contact/electronic method which measures a vaporization quantity through a temperature variation value and a power variation value during vaporization of a raw material. Therefore, since, differently from a contact method, a vaporization quantity measuring unit does not directly contact a raw material gas, various raw materials can be supplied and large quantity raw material supply or long time raw material supply can be achieved without deterioration of the function. In addition, preciseness of the raw material supply may be enhanced since the electronic method is capable of precise measurement of the vaporization quantity.

    摘要翻译： 公开了一种蒸发装置及其控制方法。 蒸发装置包括适于容纳原料的蒸发坩埚; 蒸发加热单元，其适于通过加热所述蒸发坩埚来蒸发所述原料; 适于测量蒸发坩埚的温度的温度测量单元; 功率测量单元，适于测量蒸发加热单元的施加功率; 以及控制单元，其适于基于所述温度测量单元的温度变化值和所述功率测量单元的功率变化值中的任一个来控制所述原材料的蒸发量。 蒸发装置使用在原料蒸发期间通过温度变化值和功率变化值来测量蒸发量的非接触/电子方法。 因此，与接触方法不同的是，蒸发量测量单元不直接接触原料气体，可以供给各种原料，并且可以在不降低功能的情况下实现大量的原料供给或长时间的原料供给 。 此外，由于电子方法能够精确地测量蒸发量，所以可以提高原料供应的精度。

    VACUUM DEPOSITION APPARATUS
    2.
    发明申请
    VACUUM DEPOSITION APPARATUS 审中-公开
    真空沉积装置

    公开(公告)号：US20120291708A1

    公开(公告)日：2012-11-22

    申请号：US13522841

    申请日：2011-01-21

    申请人： Byeong Min Bak ,  Doo Won Gong ,  Jin Haon Kwon ,  Yong Beom Jung ,  Whang Sin Cho ,  Sung Jae Jung

    发明人： Byeong Min Bak ,  Doo Won Gong ,  Jin Haon Kwon ,  Yong Beom Jung ,  Whang Sin Cho ,  Sung Jae Jung

    IPC分类号： C23C16/44

    CPC分类号： C23C14/56 ,  C23C16/4412 ,  C23C16/54

    摘要： Disclosed is a vacuum deposition apparatus, which comprises: a chamber mounted with a source for jetting an application material in the gaseous state for deposition onto a substrate; heaters formed to the inner wall of the chamber and internal parts; a pump for aspirating air out of the chamber; and a plurality of cold traps interposed between the chamber and the pump for cooling the air aspirated by the pump to remove the application material from the air. According to the vacuum deposition apparatus, it is possible to prevent direct damage to the internal parts or the inner wall of the chamber by application materials accumulated thereon. Additionally, the plurality of cold traps prevent pollution and stoppage in continuous production which allows substitution to be carried out without stoppage. Therefore, productivity may be improved compared to other equipment with similar specifications.

    摘要翻译： 公开了一种真空沉积设备，其包括：安装有用于喷射处于气态的涂布材料的源的腔室，用于沉积到衬底上; 加热器形成在腔室的内壁和内部部件上; 用于将空气抽出室的泵; 以及插入在所述室和所述泵之间的多个冷阱，用于冷却由所述泵抽吸的空气以从所述空气中除去所述施加材料。 根据真空沉积设备，可以通过积聚在其上的施加材料来防止对室的内部部件或内壁的直接损坏。 此外，多个冷阱能够防止连续生产中的污染和停止，从而能够不间断地进行替代。 因此，与具有相似规格的其他设备相比，可以提高生产率。