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    High Frequency Ultrasound Detection Using Polymer Optical-Ring Resonator
    1.
    发明申请
    High Frequency Ultrasound Detection Using Polymer Optical-Ring Resonator 有权
    使用聚合物光环谐振器进行高频超声检测

    公开(公告)号：US20080095490A1

    公开(公告)日：2008-04-24

    申请号：US11662154

    申请日：2005-09-08

    申请人： Shai Ashkenazi ,  Lingjie J. Guo ,  Matthew O'Donnell

    发明人： Shai Ashkenazi ,  Lingjie J. Guo ,  Matthew O'Donnell

    IPC分类号： G02B6/00

    CPC分类号： G02B6/12007 ,  A61B5/0097 ,  G01H9/004 ,  G02B6/1221

    摘要： A polymer waveguide resonator device for high-frequency ultrasound detection having a optical resonator coupled to a straight optical waveguide which serves as input and output ports. Acoustic waves irradiating the waveguide induce strain modifying the waveguide cross-section or other design property. As a consequence, the effective refractive index of optical waves propagating along the ring is modified. The sharp wavelength dependence of the high Q-factor resonator enhances the optical response to acoustic strain. High sensitivity is demonstrated experimentally in detecting broadband ultrasound pulses from a 10 MHz transducer.

    摘要翻译： 一种用于高频超声检测的聚合物波导谐振器装置，其具有耦合到用作输入和输出端口的直线光波导的光谐振器。 辐射波导的声波诱导应变调整波导横截面或其他设计特性。 因此，沿着环传播的光波的有效折射率被改变。 高Q因子谐振器的尖锐波长依赖性增强了对声学应变的光学响应。 在10 MHz传感器检测宽带超声波脉冲中，实验证明了高灵敏度。

    Combined nanoimprinting and photolithography for micro and nano devices fabrication
    2.
    发明授权
    Combined nanoimprinting and photolithography for micro and nano devices fabrication 有权
    用于微纳米器件制造的组合纳米压印和光刻

    公开(公告)号：US07374864B2

    公开(公告)日：2008-05-20

    申请号：US10545456

    申请日：2004-02-13

    申请人： Lingjie J. Guo ,  Xing Cheng

    发明人： Lingjie J. Guo ,  Xing Cheng

    IPC分类号： G03C5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/50

    摘要： A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.

    摘要翻译： 一种制造器件的方法，包括将具有突起的模具压印在具有抗蚀剂层的基底上，使得突起与抗蚀剂层接合。 模具还具有通常邻近抗蚀剂层定位的掩模构件。 然后将辐射能量透过模具并进入抗蚀剂层; 然而，掩模构件基本上防止辐射能量透过，从而在抗蚀剂层中限定未曝光区域。 一旦将模具从基底上移除，从而形成纳米压印的第一特征，则通过溶解在显影剂溶液中去除抗蚀剂层的未曝光区域。