公开(公告)号：US20060001945A1

公开(公告)日：2006-01-05

申请号：US11002766

申请日：2004-12-02

申请人： Shan-Hua Wu ,  Fei-Yun Chen ,  Wei-Ya Wang ,  Hung-Hsin Liu ,  Sheng-Liang Pan

发明人： Shan-Hua Wu ,  Fei-Yun Chen ,  Wei-Ya Wang ,  Hung-Hsin Liu ,  Sheng-Liang Pan

IPC分类号： G02B26/00

CPC分类号： G02B26/0833

摘要： A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.

摘要翻译： 一种用于制造诸如反射式隐形镜的微机电系统的方法包括以下步骤：形成I形镜结构; 在所述I形镜结构上形成间隔层; 以及图案化间隔层以沿着I形镜结构的一侧形成至少一个间隔物。

公开(公告)号：US07180651B2

公开(公告)日：2007-02-20

申请号：US11002766

申请日：2004-12-02

申请人： Shan-Hua Wu ,  Fei-Yun Chen ,  Wei-Ya Wang ,  Hung-Hsin Liu ,  Sheng-Liang Pan

发明人： Shan-Hua Wu ,  Fei-Yun Chen ,  Wei-Ya Wang ,  Hung-Hsin Liu ,  Sheng-Liang Pan

IPC分类号： G02F26/00

CPC分类号： G02B26/0833

摘要： A method for use in manufacturing a microelectromechanical system, such as a reflective stealth mirror includes the steps of: forming an I-shape mirror structure; forming a spacer layer over the I-shape mirror structure; and patterning the spacer layer to form at least one spacer along a side of the I-shape mirror structure.

摘要翻译： 一种用于制造诸如反射式隐形镜的微机电系统的方法包括以下步骤：形成I形镜结构; 在所述I形镜结构上形成间隔层; 以及图案化间隔层以沿着I形镜结构的一侧形成至少一个间隔物。

公开(公告)号：US20050260784A1

公开(公告)日：2005-11-24

申请号：US10978011

申请日：2004-10-29

申请人： Fei-Yun Chen ,  Wei-Ya Wang ,  Yuh-Hwa Chang ,  Tzu-Yang Wu

发明人： Fei-Yun Chen ,  Wei-Ya Wang ,  Yuh-Hwa Chang ,  Tzu-Yang Wu

IPC分类号： G02B26/08 ,  H01L21/00

CPC分类号： G02B26/0833

摘要： An MEMS mirror structure is formed using an etching process that forms sidewall oxide spacers while maintaining the integrity of the oxide layer formed over the reflective layer of the MEMS mirror structure. The discrete mirror structure is formed to include a reflective layer sandwiched between oxide layers and with a protect layer formed over the upper oxide layer. A spacer oxide layer is formed to cover the structure and oxide spacers are formed on sidewalls of the discrete structure using a selective etch process that is terminated when horizontal portions of the spacer oxide layer have cleared to expose the release layer formed below the discrete mirror structure and the protect layer. The superjacent protect layer prevents the spacer oxide etch process from attacking the upper oxide layer and therefore maintains the integrity of the upper oxide layer and the functionality of the mirror structure.

摘要翻译： 使用形成侧壁氧化物间隔物的蚀刻工艺形成MEMS镜结构，同时保持在MEMS镜结构的反射层上形成的氧化物层的完整性。 离散镜结构被形成为包括夹在氧化物层之间的反射层和形成在上氧化物层上的保护层。 形成间隔氧化物层以覆盖该结构，并且使用选择性蚀刻工艺在离散结构的侧壁上形成氧化物间隔物，该选择性蚀刻工艺在间隔氧化物层的水平部分已经清除以暴露形成在离散镜结构下方的释放层时终止 和保护层。 上部保护层防止间隔氧化物蚀刻工艺攻击上部氧化物层，从而保持上部氧化物层的完整性和反射镜结构的功能。

公开(公告)号：US07205176B2

公开(公告)日：2007-04-17

申请号：US10978011

申请日：2004-10-29

申请人： Fei-Yuh Chen ,  Wei-Ya Wang ,  Yuh-Hwa Chang ,  Tzu-Yang Wu

发明人： Fei-Yuh Chen ,  Wei-Ya Wang ,  Yuh-Hwa Chang ,  Tzu-Yang Wu

IPC分类号： H01L21/00

CPC分类号： G02B26/0833

摘要： An MEMS mirror structure is formed using an etching process that forms sidewall oxide spacers while maintaining the integrity of the oxide layer formed over the reflective layer of the MEMS mirror structure. The discrete mirror structure is formed to include a reflective layer sandwiched between oxide layers and with a protect layer formed over the upper oxide layer. A spacer oxide layer is formed to cover the structure and oxide spacers are formed on sidewalls of the discrete structure using a selective etch process that is terminated when horizontal portions of the spacer oxide layer have cleared to expose the release layer formed below the discrete mirror structure and the protect layer. The superjacent protect layer prevents the spacer oxide etch process from attacking the upper oxide layer and therefore maintains the integrity of the upper oxide layer and the functionality of the mirror structure.

摘要翻译： 使用形成侧壁氧化物间隔物的蚀刻工艺形成MEMS镜结构，同时保持在MEMS镜结构的反射层上形成的氧化物层的完整性。 离散镜结构被形成为包括夹在氧化物层之间的反射层和形成在上氧化物层上的保护层。 形成间隔氧化物层以覆盖该结构，并且使用选择性蚀刻工艺在离散结构的侧壁上形成氧化物间隔物，该选择性蚀刻工艺在间隔氧化物层的水平部分已经清除以暴露形成在离散镜结构下方的释放层时终止 和保护层。 上部保护层防止间隔氧化物蚀刻工艺攻击上部氧化物层，从而保持上部氧化物层的完整性和反射镜结构的功能。

公开(公告)号：US20120293757A1

公开(公告)日：2012-11-22

申请号：US13562278

申请日：2012-07-30

申请人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

发明人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

IPC分类号： G02F1/1335 ,  G02B5/22

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G02B5/223

摘要： A manufacturing method of a color filter including following steps is provided. First, a partition is formed on a substrate to form a plurality of pixel regions on the substrate. Next, a color pigment is provided along a continuous pigment-providing route, so as to form the color pigment on a sequence of pixel regions among the plurality of pixel regions and the partition. The method mentioned above can prevent the unfilled phenomenon of the pigment around the corners of the pixel region. Besides, a liquid crystal display panel having the color filter is also provided.

摘要翻译： 提供了包括以下步骤的滤色器的制造方法。 首先，在基板上形成分隔，以在基板上形成多个像素区域。 接着，沿着连续的颜料提供路径设置彩色颜料，以便在多个像素区域和分隔物之间的像素区域序列上形成彩色颜料。 上述方法可以防止像素区域的角部附近的颜料的未填充现象。 此外，还提供了具有滤色器的液晶显示面板。

公开(公告)号：US08619220B2

公开(公告)日：2013-12-31

申请号：US13562278

申请日：2012-07-30

申请人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

发明人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

IPC分类号： B05D5/06

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G02B5/223

摘要： A manufacturing method of a color filter including following steps is provided. First, a partition is formed on a substrate to form a plurality of pixel regions on the substrate. Next, a color pigment is provided along a continuous pigment-providing route, so as to form the color pigment on a sequence of pixel regions among the plurality of pixel regions and the partition. The method mentioned above can prevent the unfilled phenomenon of the pigment around the corners of the pixel region. Besides, a liquid crystal display panel having the color filter is also provided.

摘要翻译： 提供了包括以下步骤的滤色器的制造方法。 首先，在基板上形成分隔，以在基板上形成多个像素区域。 接着，沿着连续的颜料提供路径设置彩色颜料，以便在多个像素区域和分隔物之间的像素区域序列上形成彩色颜料。 上述方法可以防止像素区域的角部附近的颜料的未填充现象。 此外，还提供了具有滤色器的液晶显示面板。

公开(公告)号：US20060037933A1

公开(公告)日：2006-02-23

申请号：US10923026

申请日：2004-08-23

申请人： Wei-Ya Wang ,  Chung-Yuan Cheng ,  Tzu-Yang Wu ,  Keven Hung ,  Fei-Yuh Chen

发明人： Wei-Ya Wang ,  Chung-Yuan Cheng ,  Tzu-Yang Wu ,  Keven Hung ,  Fei-Yuh Chen

IPC分类号： C23F1/00 ,  B44C1/22

CPC分类号： C23F4/00 ,  B81B2201/04 ,  G02B26/0833

摘要： A mirror process uses a tungsten passivation layer to prevent metal-spiking induced mirror bridging and improve mirror curvature. A mirror structure is patterned on a first sacrificial layer overlying a substrate. A tungsten passivation layer is then blanket deposited to cover the top and sidewalls of the mirror structure. A second sacrificial layer is formed overlying the tungsten passivation layer. A releasing process with an etchant including XeF2 is performed to remove the second sacrificial layer, the tungsten passivation layer and the first sacrificial layer simultaneously.

摘要翻译： 镜面处理使用钨钝化层来防止金属尖峰引起的反射镜桥接并改善镜面曲率。 在覆盖衬底的第一牺牲层上图案化镜面结构。 钨钝化层然后被覆盖沉积以覆盖镜结构的顶部和侧壁。 覆盖钨钝化层的第二牺牲层被形成。 执行包括XeF 2＆gt; 2的蚀刻剂的释放过程以同时去除第二牺牲层，钨钝化层和第一牺牲层。

公开(公告)号：US20090195574A1

公开(公告)日：2009-08-06

申请号：US12423919

申请日：2009-04-15

申请人： Wen-Lung Chen ,  Shu-Chin Lee ,  Wei-Ya Wang

发明人： Wen-Lung Chen ,  Shu-Chin Lee ,  Wei-Ya Wang

IPC分类号： B41J29/38

CPC分类号： B41J2/2132

摘要： A method for jetting color ink includes determining an initial voltage value of a nozzle, wherein the initial voltage value corresponds to a predetermined jetting volume of the nozzle; determining a maximum adjusting voltage value of the nozzle, wherein the maximum adjusting voltage value may correspond to an allowable error value of the predetermined jetting volume; combining the initial voltage value with an adjusting voltage value to obtain a jetting voltage, wherein the adjusting voltage value may be randomly selected between zero to the maximum adjusting voltage value; and jetting the color ink from the nozzle according to the jetting voltage onto a sub-pixel in a pixel.

摘要翻译： 喷墨彩色墨水的方法包括确定喷嘴的初始电压值，其中初始电压值对应于喷嘴的预定喷射体积; 确定所述喷嘴的最大调节电压值，其中所述最大调节电压值可对应于所述预定喷射体积的容许误差值; 将初始电压值与调整电压值组合以获得喷射电压，其中调节电压值可以在零到最大调整电压值之间随机选择; 并且根据喷射电压将彩色墨从喷嘴喷射到像素中的子像素上。

公开(公告)号：US20090042113A1

公开(公告)日：2009-02-12

申请号：US12040922

申请日：2008-03-03

申请人： Yong-Mao Lin ,  Wen-Lung Chen ,  Yung-Lung Lin ,  Fu-Chuan Tsai ,  Wei-Ya Wang ,  Chun-Chieh Tsao ,  Shu-Chin Lee

发明人： Yong-Mao Lin ,  Wen-Lung Chen ,  Yung-Lung Lin ,  Fu-Chuan Tsai ,  Wei-Ya Wang ,  Chun-Chieh Tsao ,  Shu-Chin Lee

IPC分类号： G03F7/16

CPC分类号： G02B5/201

摘要： A manufacturing method of a filter is provided. The manufacturing method includes steps as follows. First, a substrate is provided and a black matrix is formed on the substrate. The black matrix has a number of openings arranged in array. Next, a filter material is individually formed in the openings by inkjet printing or other methods, and the filter material includes a solvent and a dye mixed with the solvent. Thereafter, a thermal treatment is performed and an evaporation rate of the solvent during the thermal treatment is reduced, so as to cure the filter material. As the evaporation rate of the solvent is relatively slow, the filter material is still flowable during the thermal treatment. Hence, the cured filter material has a flat surface. The filter fabricated by the above manufacturing method has an even hue and a well flattened surface.

摘要翻译： 提供了一种过滤器的制造方法。 制造方法包括以下步骤。 首先，提供基板，并在基板上形成黑矩阵。 黑色矩阵具有排列成阵列的多个开口。 接下来，通过喷墨印刷或其它方法在开口中分别形成过滤材料，过滤材料包括溶剂和与溶剂混合的染料。 此后，进行热处理，并且在热处理期间溶剂的蒸发速率降低，以使过滤材料固化。 当溶剂的蒸发速率相对较慢时，过滤材料在热处理期间仍然是可流动的。 因此，固化的过滤材料具有平坦的表面。 通过上述制造方法制造的过滤器具有均匀色调和平坦的表面。

公开(公告)号：US20090035518A1

公开(公告)日：2009-02-05

申请号：US11944415

申请日：2007-11-22

申请人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

发明人： Wei-Ya Wang ,  Shu-Chin Lee ,  Wen-Lung Chen ,  Fu-Chuan Tsai ,  Yung-Lung Lin ,  Yong-Mao Lin ,  Chun-Chieh Tsao

IPC分类号： G03F1/00

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G02B5/223

摘要： A manufacturing method of a color filter including following steps is provided. First, a partition is formed on a substrate to form a plurality of pixel regions on the substrate. Next, a color pigment is provided along a continuous pigment-providing route, so as to form the color pigment on a sequence of pixel regions among the plurality of pixel regions and the partition. The method mentioned above can prevent the unfilled phenomenon of the pigment around the corners of the pixel region. Besides, a liquid crystal display panel having the color filter is also provided.

摘要翻译： 提供了包括以下步骤的滤色器的制造方法。 首先，在基板上形成分隔，以在基板上形成多个像素区域。 接着，沿着连续的颜料提供路径设置彩色颜料，以便在多个像素区域和分隔物之间的像素区域序列上形成彩色颜料。 上述方法可以防止像素区域的角部附近的颜料的未填充现象。 此外，还提供了具有滤色器的液晶显示面板。