公开(公告)号：US20170053779A1

公开(公告)日：2017-02-23

申请号：US15239871

申请日：2016-08-18

Applicant: Shibaura Mechatronics Corporation

Inventor： Kazuki Nakazawa ,  Hiroki Shirahama ,  Yoshie Okamoto

IPC: H01J37/32 ,  C23C16/50

CPC classification number: H01J37/32009 ,  C23C16/507 ,  C23C16/54 ,  H01J37/3178 ,  H01J37/32733 ,  H01J37/32743 ,  H01J37/32899 ,  H01J2237/184 ,  H01L21/67201 ,  H01L2221/67

Abstract: According to one embodiment, a substrate processing apparatus includes a processor, a transferring part, a load lock unit, and a transfer unit. The processor performs processing of a substrate in an atmosphere. The transferring part transfers the substrate in an environment having a pressure higher than the pressure when performing the processing. The load lock unit is provided between the processor and the transferring part. The transfer unit is provided between the load lock unit and the processor. The load lock unit includes a supporter, and a drive unit. The supporter supports the substrate. The drive unit moves a position in a rotation direction of the supporter. The transfer unit transfers the substrate from the processor to the supporter partway through the processing of the substrate in the processor. The drive unit moves a position in a rotation direction of the transferred substrate.

Abstract translation: 根据一个实施例，基板处理装置包括处理器，转印部分，装载锁定单元和转印单元。 处理器在大气中进行基板的处理。 转印部件在进行处理时，在压力高于压力的环境下转印基板。 负载锁定单元设置在处理器和转印部件之间。 传送单元设置在加载锁定单元和处理器之间。 负载锁定单元包括支撑件和驱动单元。 支架支撑基板。 驱动单元沿着支撑件的旋转方向移动位置。 转移单元通过处理器中的衬底的处理将衬底从处理器转移到支撑件。 驱动单元沿所转印的基板的旋转方向移动位置。