Reflective mask cleaning apparatus and reflective mask cleaning method

    公开(公告)号:US11609491B2

    公开(公告)日:2023-03-21

    申请号:US16715044

    申请日:2019-12-16

    IPC分类号: G03F1/24 G03F1/82 B08B7/00

    摘要: A reflective mask cleaning apparatus according to an embodiment comprises a first supply section configured to supply a first solution containing at least one of an organic solvent and a surfactant to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.
    A reflective mask cleaning apparatus according to an alternative embodiment comprises a third supply section configured to supply a plasma product produced from a reducing gas to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.

    REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD
    2.
    发明申请
    REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD 审中-公开
    反光面罩清洁装置和反光面膜清洁方法

    公开(公告)号:US20170017151A1

    公开(公告)日:2017-01-19

    申请号:US15124409

    申请日:2015-02-19

    IPC分类号: G03F1/82 B08B7/00 G03F1/24

    CPC分类号: G03F1/82 B08B7/0035 G03F1/24

    摘要: A reflective mask cleaning apparatus according to an embodiment comprises a first supply section configured to supply a first solution containing at least one of an organic solvent and a surfactant to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.A reflective mask cleaning apparatus according to an alternative embodiment comprises a third supply section configured to supply a plasma product produced from a reducing gas to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.

    摘要翻译: 根据替代实施例的反射掩模清洁装置包括第三供应部分,其构造成将由还原气体产生的等离子体产物供应到设置在反射掩模中的含钌覆盖层; 以及第二供给部,其构造成向所述封盖层供给还原溶液和无氧溶液中的至少一种。

    IMPRINT TEMPLATE MANUFACTURING APPARATUS AND IMPRINT TEMPLATE MANUFACTURING METHOD

    公开(公告)号:US20180117795A1

    公开(公告)日:2018-05-03

    申请号:US15860044

    申请日:2018-01-02

    摘要: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.

    IMPRINT TEMPLATE MANUFACTURING APPARATUS
    5.
    发明申请

    公开(公告)号:US20180015497A1

    公开(公告)日:2018-01-18

    申请号:US15717435

    申请日:2017-09-27

    摘要: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.

    Imprint template treatment apparatus
    6.
    发明授权

    公开(公告)号:US10668496B2

    公开(公告)日:2020-06-02

    申请号:US15717435

    申请日:2017-09-27

    摘要: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.