SEMICONDUCTOR LIGHT RECEIVING ELEMENT
    2.
    发明申请
    SEMICONDUCTOR LIGHT RECEIVING ELEMENT 失效
    半导体接收元件

    公开(公告)号:US20100276775A1

    公开(公告)日:2010-11-04

    申请号:US12810089

    申请日:2008-12-25

    申请人: Emiko Fujii

    发明人: Emiko Fujii

    IPC分类号: H01L31/107 H01L31/0352

    CPC分类号: H01L31/107 H01L31/02161

    摘要: The semiconductor light receiving element 1 includes a semiconductor substrate 101, and a semiconductor layer having a photo-absorption layer 105 disposed on the top of the semiconductor substrate 101. The semiconductor layer of the semiconductor light receiving element 1 containing at least the photo-absorption layer 105 has a mesa structure, and a side wall of the mesa is provided with a protective film 113 covering the side wall. The protective film 113 is a silicon nitride film containing hydrogen, and a hydrogen concentration in one surface of the protective film 113 located at the side of the mesa side wall is lower than a hydrogen concentration in the other surface of the protective film 113 located at the side that is opposite to the side of the mesa side wall.

    摘要翻译: 半导体光接收元件1包括半导体衬底101和设置在半导体衬底101的顶部上的具有光吸收层105的半导体层。半导体光接收元件1的半导体层至少包含光吸收 层105具有台面结构,台面的侧壁设置有覆盖侧壁的保护膜113。 保护膜113是含有氢的氮化硅膜,位于台面侧壁侧的保护膜113的一个面的氢浓度低于位于保护膜113的另一面的氢浓度 与台面侧壁相对的一侧。

    Semiconductor light receiving element
    3.
    发明授权
    Semiconductor light receiving element 失效
    半导体光接收元件

    公开(公告)号:US08212286B2

    公开(公告)日:2012-07-03

    申请号:US12810089

    申请日:2008-12-25

    申请人: Emiko Fujii

    发明人: Emiko Fujii

    CPC分类号: H01L31/107 H01L31/02161

    摘要: The semiconductor light receiving element 1 includes a semiconductor substrate 101, and a semiconductor layer having a photo-absorption layer 105 disposed on the top of the semiconductor substrate 101. The semiconductor layer of the semiconductor light receiving element 1 containing at least the photo-absorption layer 105 has a mesa structure, and a side wall of the mesa is provided with a protective film 113 covering the side wall. The protective film 113 is a silicon nitride film containing hydrogen, and a hydrogen concentration in one surface of the protective film 113 located at the side of the mesa side wall is lower than a hydrogen concentration in the other surface of the protective film 113 located at the side that is opposite to the side of the mesa side wall.

    摘要翻译: 半导体光接收元件1包括半导体衬底101和设置在半导体衬底101的顶部上的具有光吸收层105的半导体层。半导体光接收元件1的半导体层至少包含光吸收 层105具有台面结构,台面的侧壁设置有覆盖侧壁的保护膜113。 保护膜113是含有氢的氮化硅膜,位于台面侧壁侧的保护膜113的一个面的氢浓度低于位于保护膜113的另一面的氢浓度 与台面侧壁相对的一侧。