公开(公告)号：US07231642B2

公开(公告)日：2007-06-12

申请号：US10275622

申请日：2001-03-19

申请人： Shinichiro Araki ,  Minoru Yoshida ,  Akio Uekawa ,  Yosuke Asai ,  Mitsuo Shimotani ,  Fumitaka Sato

发明人： Shinichiro Araki ,  Minoru Yoshida ,  Akio Uekawa ,  Yosuke Asai ,  Mitsuo Shimotani ,  Fumitaka Sato

IPC分类号： G06F3/00 ,  G06F9/44 ,  G06F9/46 ,  G06F13/00

CPC分类号： G06F9/46

摘要： An on-vehicle multimedia device to be operated by software 16 including an application module group 18 having a plurality of application modules 19 that realizes their respective different functions and an application control module 17 for controlling each of the application modules 19, characterized by the device comprising external hardware which inputs and outputs data to be processed by the software.

摘要翻译： 一种由软件16操作的车载多媒体设备，包括具有实现各自不同功能的多个应用模块19的应用模块组18和用于控制每个应用模块19的应用控制模块19，其特征在于该设备 包括输入和输出要由软件处理的数据的外部硬件。

公开(公告)号：US06639601B1

公开(公告)日：2003-10-28

申请号：US09606073

申请日：2000-06-29

申请人： Yosuke Asai ,  Akio Uekawa ,  Shinichiro Araki

发明人： Yosuke Asai ,  Akio Uekawa ,  Shinichiro Araki

IPC分类号： G09G1500

CPC分类号： G09G5/00

摘要： At least one graphic element includes basic element data of an image, such as a menu, and attributes of the basic element. At least one animation element associated with the graphic element describes a condition and a procedure for dynamically changing an attribute of the graphic element when the condition is fulfilled. The graphic element and the animation element are stored as drawing data. When the condition is fulfilled, the procedure described in the animation element is executed so that an attribute of the graphic element is changed.

摘要翻译： 至少一个图形元素包括诸如菜单的图像的基本元素数据和基本元素的属性。 与图形元素相关联的至少一个动画元素描述了当满足条件时动态地改变图形元素的属性的条件和过程。 图形元素和动画元素存储为绘图数据。 当满足条件时，执行动画元素中描述的过程，使得图形元素的属性被改变。

公开(公告)号：US07609361B2

公开(公告)日：2009-10-27

申请号：US12031263

申请日：2008-02-14

申请人： Shinichiro Araki

发明人： Shinichiro Araki

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  G03D5/00

CPC分类号： H01L21/0276 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70925

摘要： A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an immersion liquid during an immersion exposure process, and rated abnormal from those to be processed by the immersion exposure process. The substrate processing system is provided with a protective film forming module for forming a protective film on a resist film formed on a surface of a wafer W, an exposure system 4 for processing the surface of the wafer W coated with a transparent immersion liquid layer by an immersion exposure process, and a developing module 28 for processing the wafer W by a developing process using a developer. A protective film inspecting device 33 detects surface defects in a protective film formed on a wafer W. A control computer 60 decides whether or not surface defects detected by the protective film inspecting device 33 is normal on the basis of information about the surface defects provided by the protective film inspecting device 33, and gives a control signal representing the results of decision to the exposure system 4. The control computer 60 gives an exposure process execution signal requesting processing the wafer W by the exposure process to the exposure system 4 when the surface defects in the protective film are rated normal or gives an exposure process not executing signal requesting not processing the substrate by the exposure process to the exposure system when the surface defects in the protective film are rated abnormal.

摘要翻译： 基板处理方法和基板处理系统不包括具有表面缺陷的保护膜的晶片W，所述保护膜在浸没曝光处理期间会使抗蚀剂的成分溶解在浸没液体中，并且与通过浸没处理的那些进行额定异常 曝光过程。 基板处理系统设置有用于在形成在晶片W的表面上的抗蚀剂膜上形成保护膜的保护膜形成模块，用于通过以下步骤处理涂覆有透明浸没液体层的晶片W的表面的曝光系统4 浸渍曝光工艺和用于通过使用显影剂的显影处理来处理晶片W的显​​影模块28。 保护膜检查装置33检测形成在晶片W上的保护膜中的表面缺陷。控制计算机60基于由关于由保护膜检查装置33提供的表面缺陷的信息来判定由保护膜检查装置33检测到的表面缺陷是否正常 保护膜检查装置33，并且向曝光系统4给出表示决定结果的控制信号。控制计算机60给曝光处理执行信号通过对曝光系统4的曝光处理来请求处理晶片W，当表面 当保护膜中的表面缺陷被评定为异常时，保护膜中的缺陷被评为正常或给出不执行信号的曝光处理，该信号请求不通过对曝光系统的曝光处理来处理衬底。

公开(公告)号：US20080249648A1

公开(公告)日：2008-10-09

申请号：US12026836

申请日：2008-02-06

申请人： Shinichiro Araki

发明人： Shinichiro Araki

IPC分类号： G06F17/00

CPC分类号： H01L21/6715 ,  H01L21/67276

摘要： Disclosed is a system which makes it possible to determine whether or not a new operation recipe is applicable to a substrate processing apparatus, the apparatus including plural functional components which operate to perform predetermined tasks to a substrate, and a controller comprising a computer which controls operations of the plural functional components based on an operation recipe including a plurality of operation parameters. An electronic medium storing a new operation recipe and a judgment program is connected to the computer of the substrate processing apparatus. The new operation recipe is retrieved from the electronic medium by means of the computer. The computer executes the judgment program to determine, by using the judgment program, whether or not the new operation recipe can be executed by the functional components.

摘要翻译： 公开了一种能够确定新的操作配方是否适用于基板处理装置的系统，该装置包括操作以对基板执行预定任务的多个功能部件，以及控制器，其包括控制操作的计算机 基于包括多个操作参数的操作配方的多个功能部件。 存储新操作配方和判断程序的电子介质连接到基板处理装置的计算机。 通过计算机从电子介质检索新的操作配方。 计算机执行判断程序以通过使用判断程序来确定是否可以由功能部件执行新的操作配方。

公开(公告)号：US5564889A

公开(公告)日：1996-10-15

申请号：US262329

申请日：1994-06-17

申请人： Shinichiro Araki

发明人： Shinichiro Araki

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01L21/687 ,  B65G35/00

CPC分类号： H01L21/68707 ,  Y10S414/135

摘要： A resist coating system for semiconductor wafers has a treatment unit and a transfer unit. The treatment unit has a plurality of treatment sections, and a transfer robot moves along the treatment sections. The transfer robot has a vertically movable driving block and first, and second and third arms for holding the semiconductor wafers, which are vertically arranged on the driving block and supported by the same such that they can advance and retreat independent of one another, and an adiabatic plate supported by the driving block between the third arm and the first and second arms. The third arm is used to take each wafer out of a cooling section, which is one of the treatment section. The wafer exchange in each treatment section is performed by means of two of the first through third arms. An arm for taking from the treatment section a wafer having been treated is operated in synchronism with another arm for inserting into the section a wafer to be treated.

摘要翻译： 用于半导体晶片的抗蚀涂层系统具有处理单元和转印单元。 处理单元具有多个处理部，传送机器人沿着处理部移动。 传送机器人具有可垂直移动的驱动块和用于保持半导体晶片的第一和第二和第三臂，其垂直地布置在驱动块上并被其支撑，使得它们可以彼此独立地前进和后退，并且 绝热板由第三臂与第一和第二臂之间的驱动块支撑。 第三臂用于将每个晶片从冷却部分中取出，冷却部分是处理部分之一。 每个处理部分中的晶片更换通过第一至第三臂中的两个进行。 用于从治疗部分取出经处理的晶片的手臂与另一个臂同步地操作，以将要处理的晶片插入到该部分中。

公开(公告)号：US07815366B2

公开(公告)日：2010-10-19

申请号：US11719189

申请日：2005-11-08

申请人： Kouji Okamura ,  Hiroshi Tomita ,  Shuji Iwanaga ,  Shinichiro Araki

发明人： Kouji Okamura ,  Hiroshi Tomita ,  Shuji Iwanaga ,  Shinichiro Araki

IPC分类号： G01N25/00 ,  G01K3/00

CPC分类号： H01L21/67248

摘要： In the present invention, a heating plate is divided into a plurality of regions. Integrated values of temperature fluctuations in each of the regions when a substrate is mounted on the heating plate in a normal state without extraneous matter are collected. A Mahalanobis reference space in the discriminant analysis method is formed based on the integrated values at normal time. During actual heat processing, an integrated value of temperature fluctuation of each of the regions when the substrate is mounted on the heating plate is then detected, so that a Mahalanobis distance about the integrated value during the processing is calculated based on the integrated value during the processing and the Mahalanobis reference space obtained in advance. Whether or not there is extraneous matter on the heating plate is determined by comparing the calculated Mahalanobis distance to a predetermined threshold value.

摘要翻译： 在本发明中，加热板被分成多个区域。 当基板以无外界物质的正常状态安装在加热板上时，各区域的温度波动的积分值被收集。 基于正常时间的积分值，形成判别分析方法中的马氏距离参考空间。 在实际的热处理中，检测到当将基板安装在加热板上时各区域的温度波动的积分值，从而基于在该加热板期间的积分值计算处理期间的积分值的马氏距离距离 处理和事先获得的马哈拉诺比斯参考空间。 通过将计算的马氏距离与预定阈值进行比较来确定加热板上是否存在外来物质。

公开(公告)号：US20090076763A1

公开(公告)日：2009-03-19

申请号：US11719189

申请日：2005-11-08

申请人： Kouji Okamura ,  Hiroshi Tomita ,  Shuji Iwanaga ,  Shinichiro Araki

发明人： Kouji Okamura ,  Hiroshi Tomita ,  Shuji Iwanaga ,  Shinichiro Araki

IPC分类号： G01N25/00 ,  G06F15/00

CPC分类号： H01L21/67248

摘要： In the present invention, a heating plate is divided into a plurality of regions. Integrated values of temperature fluctuations in each of the regions when a substrate is mounted on the heating plate in a normal state without extraneous matter are collected. A Mahalanobis reference space in the discriminant analysis method is formed based on the integrated values at normal time. During actual heat processing, an integrated value of temperature fluctuation of each of the regions when the substrate is mounted on the heating plate is then detected, so that a Mahalanobis distance about the integrated value during the processing is calculated based on the integrated value during the processing and the Mahalanobis reference space obtained in advance. Whether or not there is extraneous matter on the heating plate is determined by comparing the calculated Mahalanobis distance to a predetermined threshold value.

摘要翻译： 在本发明中，加热板被分成多个区域。 当基板以无外界物质的正常状态安装在加热板上时，各区域的温度波动的积分值被收集。 基于正常时间的积分值，形成判别分析方法中的马氏距离参考空间。 在实际的热处理中，检测到当将基板安装在加热板上时的每个区域的温度波动的积分值，从而基于在加热板期间的积分值计算处理期间的积分值的马氏距离距离 处理和事先获得的马哈拉诺比斯参考空间。 通过将计算的马氏距离与预定阈值进行比较来确定加热板上是否存在外来物质。

公开(公告)号：US06203617B1

公开(公告)日：2001-03-20

申请号：US09272315

申请日：1999-03-19

申请人： Shinya Tanoue ,  Shinichiro Araki ,  Tatsuya Iwasaki ,  Eiichiro Kamada

发明人： Shinya Tanoue ,  Shinichiro Araki ,  Tatsuya Iwasaki ,  Eiichiro Kamada

IPC分类号： B05C1100

CPC分类号： H01L21/67276 ,  H01L21/67271 ,  H01L21/68707 ,  Y10S414/137

摘要： The present invention is a conveying unit having a controller for detecting information corresponding to the thickness of each of a plurality of raw substrates, assigning desired identifiers to the raw substrates, storing the identifiers, and causing a conveyor to convey each of the raw substrates or controlling processing conditions for a plurality of processing chambers with the identifiers corresponding to the thickness of each of the raw substrates. Thus, even if one cassette accommodates a plurality of raw substrates, the conveyor can smoothly load the same type of raw substrates to the accommodating cassette and unload them therefrom in a simple structure. The controller sets desired processing conditions for each of the processing portions corresponding to the identifiers.

摘要翻译： 本发明是一种输送单元，其具有用于检测与多个原始基板中的每一个的厚度对应的信息的控制器，将原始基板分配所需的标识符，存储标识符，并使输送机输送每个原始基板或 控制具有对应于每个原始基板的厚度的标识符的多个处理室的处理条件。 因此，即使一个盒子容纳多个原始基板，输送机也可以将相同类型的原始基板平滑地装载到收纳盒中，并以简单的结构将其卸载。 控制器为与标识符对应的每个处理部分设置所需的处理条件。

公开(公告)号：US20080212048A1

公开(公告)日：2008-09-04

申请号：US12031263

申请日：2008-02-14

申请人： Shinichiro Araki

发明人： Shinichiro Araki

IPC分类号： G03B27/42 ,  G03F7/00 ,  G03B27/52

CPC分类号： H01L21/0276 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70925

摘要： A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an immersion liquid during an immersion exposure process, and rated abnormal from those to be processed by the immersion exposure process. The substrate processing system is provided with a protective film forming module for forming a protective film on a resist film formed on a surface of a wafer W, an exposure system 4 for processing the surface of the wafer W coated with a transparent immersion liquid layer by an immersion exposure process, and a developing module 28 for processing the wafer W by a developing process using a developer. A protective film inspecting device 33 detects surface defects in a protective film formed on a wafer W. A control computer 60 decides whether or not surface defects detected by the protective film inspecting device 33 is normal on the basis of information about the surface defects provided by the protective film inspecting device 33, and gives a control signal representing the results of decision to the exposure system 4. The control computer 60 gives an exposure process execution signal requesting processing the wafer W by the exposure process to the exposure system 4 when the surface defects in the protective film are rated normal or gives an exposure process not executing signal requesting not processing the substrate by the exposure process to the exposure system when the surface defects in the protective film are rated abnormal.

摘要翻译： 基板处理方法和基板处理系统不包括具有表面缺陷的保护膜的晶片W，所述保护膜在浸没曝光处理期间会使抗蚀剂的成分溶解在浸没液体中，并且与通过浸没处理的那些进行额定异常 曝光过程。 基板处理系统设置有用于在形成在晶片W的表面上的抗蚀剂膜上形成保护膜的保护膜形成模块，用于通过以下步骤处理涂覆有透明浸没液体层的晶片W的表面的曝光系统4 浸渍曝光工艺和用于通过使用显影剂的显影处理来处理晶片W的显​​影模块28。 保护膜检查装置33检测形成在晶片W上的保护膜中的表面缺陷。控制计算机60基于由关于由保护膜检查装置33提供的表面缺陷的信息来判定由保护膜检查装置33检测到的表面缺陷是否正常 保护膜检查装置33，并且向曝光系统4给出表示决定结果的控制信号。控制计算机60给曝光处理执行信号通过对曝光系统4的曝光处理来请求处理晶片W，当表面 当保护膜中的表面缺陷被评定为异常时，保护膜中的缺陷被评为正常或给出不执行信号的曝光处理，该信号请求不通过对曝光系统的曝光处理来处理衬底。

公开(公告)号：US06444409B1

公开(公告)日：2002-09-03

申请号：US09875022

申请日：2001-06-07

申请人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

发明人： Shinichiro Araki ,  Shinko Matsumoto ,  Noriyuki Anai

IPC分类号： G03F716

摘要： A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.